Used TEL / TOKYO ELECTRON Alpha 808SCN #9097244 for sale

TEL / TOKYO ELECTRON Alpha 808SCN is a diffusion furnace and accessory for semiconductor device manufacturing. TEL Alpha 808SCN offers exceptional accuracy and control over the semiconductor device fabrication process. It is suitable for a variety of applications, such as silicon-on-insulator (SOI) and MEMS devices. TOKYO ELECTRON Alpha 808SCN is designed as a horizontal hot wall diffusion furnace, allowing for a wide range of process temperatures and cycle times. It is equipped with an indigenously-developed state-of-the-art RF-powered, high purity quartz susceptor, which allows for the reduction of interference of the RF field. This feature, along with the powerful susceptor temperature control technology, enables rapid and accurate processing of wafers. The advanced diffusing technology allows for multi-layer processing in a single chamber, and high-aspect ratio processing. Alpha 808SCN is also equipped with advanced temperature control systems which provide fine temperature control over the entire chamber, for maximum accuracy. The temperature profile can be adjusted from the reactor, allowing for precise temperature control over the entire area. Additionally, an integrated gas flow system is equipped to control reaction environment and optimize the process. TEL / TOKYO ELECTRON Alpha 808SCN also features convenient and easy-to-use software and operation tools. The software enables the operation of the diffusion furnace from remote locations, and provides automated electrical performance tests, and online monitoring of the process. The software can also be integrated to TELware, a software platform designed for monitoring and operating various TEL diffusion furnaces. TEL Alpha 808SCN is considered one of the best diffusion furnaces and accessories in the semiconductor industry as it offers high-precision performance with unparalleled ease of use. With the help of its sophisticated software, the furnace can be operated with a single button, making operations faster and easier than ever before. Additionally, the advanced temperature and reaction control systems guarantee that whatever processes applied will result in accurate and reliable semiconductor devices.