Used TEL / TOKYO ELECTRON Alpha 808SCN #9097247 for sale

TEL / TOKYO ELECTRON Alpha 808SCN is an electron cyclotron resonance (ECR) ion implantation diffusion furnace featuring a single level direct current (DC) planar magnetron source. This powerful tool can be used to deposit thin films of various materials, such as aluminum, silica, and nitride for all kinds of electronic applications. It is equipped with dual side slit-shutter controlled planar gun, for polarization independent uniformity control and energy modulation, resulting in more accurate and efficient layer deposition. TEL Alpha 808SCN is a standard platform for all ECR ion implantation diffusion/sputtering systems, with full manual and automatic control of a large number of parameters. It features a 6-zone temperature control system that can be used to regulate substrate temperature during film deposition, as well as two additional pressure control zones for optimizing the diffusion process. All operations can be managed through a simple to use, yet powerful operator's interface. The machine is designed for wafer processing up to 8-in (203.2 mm) wafers with a maximum available gas pressure of 1000 mbar. It also offers a gas purging capability enabling the user to introduce a gas purge to the deposition chamber, for improved safety and performance. In addition, it is capable of using deuterium and nitrogen for tailoring deposition processes, allowing for specialized metal oxides to be fabricated. TOKYO ELECTRON Alpha 808SCN is an extremely accurate and precise tool, providing high resolution ion implantation processes, with levels of superior performance compared to traditional tools. It has also proven to be an efficient production tool, featuring an automatic infeed/outfeed capabilities, allowing for high throughput and fast turnaround times. Alpha 808SCN is a vacuum compatible, isolated ECR single level DC planar magnetron source diffusion and sputtering tool designed to meet the latest technological and process requirements for all of your diffusion and sputtering needs. Its advanced features make it one of the leading diffusion furnaces available today.