Used TEL / TOKYO ELECTRON Alpha 808SD #293759916 for sale

ID: 293759916
Wafer Size: 8"
Vintage: 1995
Furnace, 8" Process: HTSIC WDRIV CIM: SECS Carrier and wafer transfer unit ASYST / Pb90C SMIF Layout type: U / box type LL Hand VMU-40-007 Heater Torch heater Gases: N2, O2, H2, Trans-LC Wafer Type: SEMI STD-Notch Cassette Type: Entergris / XT200-01E (25) Cassette wafers (16) Cassettes Fork type / material: 1+4 / AI208 Fork variable pitch TS4000Z System controller Pyro CTL Torch controller Signal tower colours: G/R/A Pressure display units: Pressure Mpa Cabinet exhaust display units: Kpa M121 Furnace temperature controller Does not include Quartzware Gas distribution: Conventional gas system Tubing material: Stainless steel Finish: Electro-polished FUJIKIN manual and air-operated valve MFC Power: Single phase, 120 VAC 3 Phase, 208 VAC UPS Input voltage / output voltage: 120/100 V 1995 vintage.
TEL / TOKYO ELECTRON Alpha 808SD is a diffusion furnace and accessories used in the fabrication of integrated circuits (ICs). The equipment provides repeatable and reliable thermal processing for the diffusion of dopants into the substrate for device integration. TEL Alpha 808SD features a display to allow controlling and monitoring of wafer processing. It has an open-tube design with a hydrazine oxidation chamber, a flat-plate quartz reactor and an exhaust plenum. The hydrazine oxidation chamber is designed to facilitate high temperature oxidation of silicon and other high temperature process steps. The flat-plate quartz reactor is designed to ensure a uniform temperature across the wafer while maintaining high throughput. The exhaust plenum is designed to provide efficient exhaust of hydrogen and its components. The system is equipped with two large heating elements, with a maximum temperature of 1200°C. It also features process control, which is capable of precisely controlling the thermal process parameters such as temperature, time, and flow rate. This ensures repeatable and reliable wafer processing. TOKYO ELECTRON ALPHA 808 SD includes a four-zone heating unit which enables fast heating of the wafers as well as quick cooling. The machine has an automated gas delivery tool which helps to keep the ambient conditions inside the chamber under control. The Alpha 808S provides leak detection for leaks in main chamber. It also includes a sample load port to enable loading and unloading of wafers under positive pressure. TOKYO ELECTRON Alpha 808SD is a stainless steel construction with a modular design. Stainless steel provides easy maintenance and installation. It also ensures a leak-free environment. Alpha 808SD asset comes with multiple accessories including sample holders, coolant kits, carbon rods, filament kits, and shields. Overall, TEL / TOKYO ELECTRON ALPHA 808 SD is a robust and reliable diffusion furnace and accessories designed to provide repeatable and reliable wafer diffusion processing. It is an excellent choice for fabrication of high-quality ICs.
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