Used TEL / TOKYO ELECTRON Alpha 808SD #9083539 for sale

TEL / TOKYO ELECTRON Alpha 808SD is an advanced diffusion furnace and associated accessories, designed to provide uniform, high-precision doping of semiconductor wafers. The basic design of TEL Alpha 808SD consists of a high-temperature thermal chamber, two electron beam guns, and an ancillary gas distribution equipment. This furnace is capable of working in a wide range of temperatures up to a maximum of 1,100°C. The furnace can heat samples of up to 4" diameter, and can perform up to 999 cycles, with a cycle time of 10 minutes or less. The two electron beam guns are the component responsible for uniform and precise doping of the semiconductor wafers. The guns are able to operate independently or in synchronization and produce low, medium or high electron current intensities, with an accuracy of up to +/- 10 V. The electron beam guns are further aided by the ancillary gas distribution system, which produces a molecular beam for precise application and dosing of different dopant gases into the furnace. The design also features a sophisticated vacuum unit, which includes a liquid nitrogen cooled cryopump, as well as automated gas flow and temperature regulation systems for precise control over gas flow and temperature. Finally, TOKYO ELECTRON ALPHA 808 SD also includes a sophisticated feedback control machine. This regulates the electron beam's spatial energy distribution, allowing for precision control over the sample doping process. In conclusion, TOKYO ELECTRON Alpha 808SD is an advanced and precise diffusion furnace and associated accessories, designed to provide uniform, high-precision doping of semiconductor wafers. This tool features a high-temperature thermal chamber, two electron beam guns, and an ancillary gas distribution asset, all of which combine to provide a precise and controlled doping process. Furthermore, TEL / TOKYO ELECTRON ALPHA 808 SD also features a sophisticated feedback control model which regulates the electron beam's spatial energy distribution.