Used TEL / TOKYO ELECTRON Alpha 808SD #9395109 for sale

TEL / TOKYO ELECTRON Alpha 808SD is a single-wafer diffusion furnace and accessory designed for rapid thermal processing and diffusion of chemical species, primarilly metals and dielectrics, onto semiconductor wafers. It features a fundamentally different approach to diffusion furnace design, relying on a patented inner vessel, high-temperature flanges, and furnace chamber for enabling precise and repeatable wafer processing. The inner vessel has a horizontally divided construction that enables it to be removed from the furnace for maintenance and servicing without disturbing the process. This allows for convenient and effective process maintenance, as opposed to conventional vertical furnaces, where the entire chamber must be lifted out. In terms of configuration, TEL Alpha 808SD has an 8-inch wafer radius, a 28-inch chamber length, and uses both a quartz-lined limited radiative heating furnace, as well as a row of quartz radiant tubes. This combination provides enhanced uniformity over that of a single-walled stainless steel heated diffusion unit while avoiding the abrasion issues associated with deep-etch furnaces. The furnace is designed with two other sections specifically for chemical source control: a low-pressure, rapid-pump sealed section with gas inlets and outlets, and a sealed reaction chamber. Inside this reaction chamber, volatile sources are kept separated from the wafer modules itself, ensuring consistent, repeatable, and reliable processing results. TOKYO ELECTRON ALPHA 808 SD also features a cutting-edge, highly advanced control equipment. Highly customizable, the control system enables users to set precisely the temperatures and gas flow rates they require to generate the desired results. Additionally, the multi-zone gas delivery unit allows for independent, simultaneous delivery of three different gases. Finally, the furnace features a simple loading and unloading procedure. Standard robot load trays allow for efficient loading and unloading of up to 8-inch wafers, and built-in interlocks ensure the safety and well-being of processing staff. Offering a combination of repeatability and flexibility, ALPHA 808 SD is an ideal diffusion furnace for microelectronics and semiconductor industries. With its improved evenness of heat distribution, its innovative inner vessel design, and its state-of-the-art control machine, users can realize unmatched process efficiency and precision.