Used TEL / TOKYO ELECTRON Alpha 81-ZA #9092855 for sale

TEL / TOKYO ELECTRON Alpha 81-ZA is an advanced diffusion furnace and a special set of accessories used in the process of producing semiconductor wafers. This diffusion furnace utilizes a low-pressurechemical vapor deposition (LPCVD) technique, whereby a specially constructed chamber and a heating element are used to introduce silicon variations into the wafer's surface. The Alpha 81-ZE consists of a single chamber, a heating element, a vacuum system, and a variety of controls and power supplies. The single chamber has a cylindrical design and is made of stainless-steel with a special inner lining to prevent contamination. The chamber is heated by an induction-type heating element that uses a high-frequency induction process. This induction-type heating element also features an adjustable temperature range from 600°C to 1300°C for precise control over the diffusion process. TEL Alpha 81-ZA is operated by a vacuum system which controls the introduction of different gases into the chamber which is necessary for the diffusion process. The vacuum system also controls the pressure of the chamber, which must be kept at a specific level for optimal results. Additionally, a variety of control units and power supplies are used to closely monitor and adjust the diffusion process as needed. To ensure a quality output, TOKYO ELECTRON Alpha 81-ZA also features various safety measures. This includes temperature sensors, pressure sensors, as well as overpressure and vacuum valves to ensure safe conditions. Alpha 81-ZA also includes redundant controls to ensure that the diffusion process is constantly monitored and in control. As an added bonus, TEL / TOKYO ELECTRON Alpha 81-ZA also offers a specialized set of accessories that enhance and customize its performance. These accessories include accessories for air cleaning, preventative maintenance, spare parts, fabrication tools, and measurement and analysis instruments. Each of these accessories ensures that TEL Alpha 81-ZA functions at its optimal level and produces high-quality semiconductor wafers. In summary, TOKYO ELECTRON Alpha 81-ZA is an advanced diffusion furnace and a special set of accessories used in the process of producing semiconductor wafers. This diffusion furnace utilizes a low-pressurechemical vapor deposition (LPCVD) technique and is equipped with a variety of controls, power supplies, safety measures, and specialized accessories. This furnace and the many accessories it offers provides an effective and reliable solution to the semiconductor wafer production process.