Used TEL / TOKYO ELECTRON Alpha 81-ZA #9092856 for sale

TEL / TOKYO ELECTRON Alpha 81-ZA
ID: 9092856
Wafer Size: 8"
Furnace, 8" Process capability: Pyro Zones: 5 Process gases: N2, H2, O2, DCE Controller model: TS4000 Accessories: Atmospheric system, loadsize, 100, VMU heater CE mark: Yes.
TEL / TOKYO ELECTRON Alpha 81-ZA is a diffusion furnace and its accompanying accessories—a powerful all-in-one equipment for the processing of semiconductor substrates. The system is capable of performing low temperature oxidation, high temperature oxide growth, low temperature dopant deposition, and high temperature deposition ion implantation. It is equipped with an ergonomically designed control station with user-friendly software and functions capable of performing processes from batch to single-wafer loads with minimal effort from the user. The furnace chamber, the heating source of the unit, is mounted on a steel frame and has a controlled quartz quartz inner liner and an outer shell made up of two halves of aluminum. It has a cylindrical shape with a flat top and can accommodate up to sixteen wafers. The furnace chamber is heated by a series of tungsten coils suspended from the top of the chamber and driven by a high frequency power supply. The coils are automatically removed for maintenance and replacement. The temperature of the chamber is controlled by the furnace controller, a control machine connected to the coils, which supplies power and translates the signals received from the detector, a temperature compensator, and the oven controller into the desired temperature obtained from a thermocouple gauge. The furnace controller can be programmed with different profiles for each step of the processing. Additionally, the furnace controller is equipped with safety and security features, such as interlocks, alarms, and warnings. The tool includes an exhaust valve asset connected to the chamber and equipped with a fan driven flowmeter for measuring air flow. The exhaust valve serves to keep the environment away from the high temperatures inside the furnace and prevents contamination by limiting the amount of gases emitted. TEL Alpha 81-ZA also includes a liquid refrigerant model connected to the chamber and to a fully automated pump equipment. Within the furnace chamber, there is a gas-filled tube for temperature and pressure readout. The refrigerant cools the chamber and allows for a quick recovery time when the temperature needs to be changed. TOKYO ELECTRON Alpha 81-ZA is designed to be an efficient and cost-effective solution in the semiconductor industry, providing versatile and accurate processing capabilities for demanding applications. With its ergonomically optimized control system, a simple user interface, and a wealth of advanced features, Alpha 81-ZA is the perfect choice for any lab looking to increase their processing capabilities.
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