Used TEL / TOKYO ELECTRON Alpha 81-ZV #9092858 for sale

TEL / TOKYO ELECTRON Alpha 81-ZV
ID: 9092858
Wafer Size: 8"
Furnace, 8" Process capability: PBSG Zones: 5 Controller model: TS4000 Process gases: N2 CE mark: Yes Accessories: CVD system, loadsize, 100, VMU heater.
TEL / TOKYO ELECTRON Alpha 81-ZV diffusion furnace is an automated semiconductor diffusion and thermal processing equipment that specializes in forming the polysilicon interconnects used in IC devices and other circuit elements. The diffusion furnace has a single convenient location with a temperature range of 150 to 2000 degrees Celsius. It features three integrated systems - a high-temperature, low-pressure annealing (HTLA) chamber; a low-stress furnace; and an oxidation and etching chamber. The HTLA chamber utilizes precise temperature profiling setpoints to produce uniform annealing in high-temperature processing applications. The chamber is capable of providing values from 52 to 1800 degrees Celsius for accurate anomaly performance. The low-stress furnace is also suitable for high-temperature processing applications and generates values from 45 to 1500 degrees Celsius. The oxidation and etching chamber is programmable to meet challenging oxidation and etching needs, and provides a range of values from 3 to 950 degrees Celsius. TEL Alpha 81-ZV diffusion furnace features an intelligent and flexible control system, with the ability to monitor, record, analyze, and display all parameters in real time. The intuitive and user-friendly interface provides information for users including wafer cycle status, process recipes, process time, and cycle time. The furnace also has a programmable four-zone equalizer to precisely control transverse temperature gradients. It is equipped with a graphite susceptor and also has an atmospheric-pressure hydrocarbon-based atmospheric station for uniform distribution of gases. TOKYO ELECTRON Alpha 81-ZV diffusion furnace is designed for fabrication of reliable and defect-free semiconductor devices. Its features maintain temperature uniformity across the wafer surface, and it has a data logging and analysis function for tracking cycle performance and process optimization. The furnace also has built-in safety sensors such as inert gas low-level detection, internal overpressure detection, as well as oxygen decompression protection. Additionally, the unit is compliant with SEMI S2 standards and ESD and EMI guidelines. Overall, Alpha 81-ZV diffusion furnace is an integrated machine suitable for high-temperature processing of IC components that is designed to deliver uniform annealing and reliable performance. It features a user-friendly interface, precise control tool, safety sensors and is compliant with industry standards for quality assurance.
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