Used TEL / TOKYO ELECTRON Alpha 81-ZV #9092859 for sale

TEL / TOKYO ELECTRON Alpha 81-ZV diffusion furnace is a single-bath, vertical furnace equipment used for integrated device processing. It boasts a maximum process of 1,100°C and is capable of accommodating up to 6 wafers. It is composed of a main frame, gas line, upper horizontal heat shield, lower horizontal heat shield, susceptor and wafer boat. The main frame is made of stainless steel and is equipped with a high-purity nitrogen purge gas exhaust system. It also contains a small gas cylinder place, quartz glass window and shutter. The gas line provides nitrogen, hydrogen or hydrogen halide to the reaction chamber for all kinds of processes. The upper and lower horizontal heat shields form the reaction chamber and are made of a high-grade alumina ceramic material for thermal insulation. The susceptor is cylindrical, high-temperature quartz glass and has a diameter of 8 inches (203 mm). The wafer boat is designed to hold up to six wafers with 100mm diameter. The boat is made of quartz material and provided with a built-in channel so that gas can get into the reaction chamber through the boat. The furnace has a touch screen color monitor which allows for temperature and other settings to be monitored and controlled There is also a recipe program function which allows process recipes to easily be loaded up to the furnace. The unit also features an oxidation/nitridation machine, with a variety of modes (e.g. fast oxidation, rapid nitridation, low-temperature nitridation, slot oxidation etc.) to meet various devices needs. An exhaust fan is also available for the process chamber to maintain stable pressure, ensuring a safe and clean atmosphere. Finally, a variety of safety features have been built into the design of TEL Alpha 81-ZV, which re-enforces the safe operation of the furnace in the event of power failure, in addition to alarm sounds. In conclusion, TOKYO ELECTRON Alpha 81-ZV diffusion furnace offers a comprehensive range of features which make it a highly efficient and cost effective tool for integrated device processing. It provides a combination of safety and convenience not found in other diffusion furnace systems.