Used TEL / TOKYO ELECTRON Alpha 8S-Z / 808S #9361886 for sale

TEL / TOKYO ELECTRON Alpha 8S-Z / 808S
ID: 9361886
Furnace.
TEL / TOKYO ELECTRON Alpha 8S-Z / 808S is a diffusion furnace designed for thermal processing applications. It is a high-performance, medium- to large-sized furnace equipment that provides large process capacity, excellent uniformity, excellent repeatability, and high throughput. The system utilizes halogen lamps as the heating element, which eliminates the need for an external pre-drive unit. The unit offers an innovative solution for high-temperature, high-quality process and is well-suited for a variety of challenging processes, such as low-temperature epitaxial, interlevel dielectric deposition (ILD), shallow trench isolation (STI), and metal diffusion. TEL Alpha 8S-Z / 808S comes with a wide range of options, such as the ability to program high-temperature steps of up to 1000°C. It also has the capacity to house up to four quartz wafers. The machine offers a maximum process pressure of 5 torr with its improved air turbine pump. It uses a unique filtering design to maximize process efficiency and minimize exhaust. It also utilizes a "cold-wall" feature, allowing for uniform thermal heating during operation. TOKYO ELECTRON Alpha 8S-Z / 808S also features an intuitive touch-screen control interface, a high-precision positional drive tool, and a range of other convenient features, such as an auto-loading process and auto-unloading capability. The asset also includes several accessories, such as a planar ceramic heater, an optional quartz crystal monitor, and various other optional devices, allowing for easy setup and usage. Additionally, the model offers several options for maintenance and service, including remote maintenance capability and device replacement and adjustment for faster process turnaround time. Overall, Alpha 8S-Z / 808S is an advanced and innovative diffusion furnace and accessories equipment. It offers excellent process performance, high throughput, and versatile options for both low- and high-temperature processing applications. It provides an innovative solution for users with demanding thermal processing requirements and is well-suited for a variety of challenging thermal processes.
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