Used TEL / TOKYO ELECTRON Alpha 8S-Z #293759915 for sale

TEL / TOKYO ELECTRON Alpha 8S-Z is a diffusion furnace and accessory designed for optimum efficiency and reliability. Equipped with a automatic gas flow control equipment, it provides a uniform temperature distribution over the entire wafer surface in the diffusion process. It also utilizes a special advanced shielding system to prevent outgassing from occurring and contaminating a wafer. TEL ALPHA 8SZ offers a wide range of features to ensure easy and reliable operation. TOKYO ELECTRON ALPHA 8 S-Z has a large, square-shaped chamber and utilizes a two-stage process for high speed temperature ramp up and cool down rates. The chamber is equipped with an advanced gas flow control unit that ensures uniform gas distribution, preventing outgassing from occurring and protecting the wafer from contamination. Furthermore, the furnace has a wide range of temperature settings from 0 to 1000 degrees Celsius. It is also equipped with a high-accuracy temperature control machine to achieve optimal heat distribution over the entire wafer surface. The diffusion furnace is also equipped with a host of accessories, such as a temperature control tool, several gas sources, a temperature record device, a cooling asset, safety features, and a number of other features. It also comes with a gas distribution model and advanced cooling mechanism to make sure the temperature is evenly distributed throughout the chamber. The chamber also has an advanced scrubber to clean any byproducts of the diffusion process before they become airborne and enter the wafer. TEL / TOKYO ELECTRON ALPHA 8 S-Z is a powerful tool for precision diffusion processes. Not only does it provide reliable and uniform temperature over the entire wafer surface, but it also has a high rate of speed for heating up the chamber and cooling it down. The accessories bundled with the furnace also allow for an easy and efficient operation of the equipment. The combination of features makes ALPHA 8 S-Z an ideal tool for a variety of challenging diffusion processes.