Used TEL / TOKYO ELECTRON Alpha 8S-Z #293765255 for sale

TEL / TOKYO ELECTRON Alpha 8S-Z is a high-precision diffusion furnace and accessory that can be used for the deposition of a variety of metallic, semiconductor, and ceramic films. It is an excellent choice for both research and production applications. TEL ALPHA 8SZ is a single-wafer thermal processing equipment with a maximum operating temperature of up to 1200°C. It also has an ultra-fast heating/cooling cycle time of just 31 seconds. This enables rapid reaction times for processes such as thermal oxidation and deposition. The system is also capable of achieving a high degree of deposition uniformity across the wafer surface. TOKYO ELECTRON ALPHA 8 S-Z utilizes Shower Plate Technology which allows for displacement type horizontal deposition. This gives the user the ability to precisely control the uniformity of the film with a high degree of accuracy. Additionally, the unit also has unique programmed film control capabilities that allow for rapid and accurate tuning of the film characteristics. TEL / TOKYO ELECTRON ALPHA 8 S-Z features a low-leakage differential pressure design that enables efficient evacuation and backfilling of the chamber. This machine also is equipped with a remote interlock tool, as well as an ambient pressure control asset for superior reliability and performance. Additionally, it includes a "time-space" throttle valve which ensures precise gas flow control for improved process uniformity. ALPHA 8 S-Z is equipped with a high-performance IO-Link Software model for easy data acquisition and control. It also includes a wide selection of accessories, including glass plates, quartz boats, and carriers, to deliver the exact parameters desired for any process. Overall, TOKYO ELECTRON ALPHA 8 S Z is an ideal solution for a variety of thermal processing applications. With its superior accuracy and reliability, it can help to optimize production times while still delivering a high degree of quality control. This equipment makes it possible for operators to precisely control the film characteristics and improve process uniformity and throughput.