Used TEL / TOKYO ELECTRON Alpha 8S-Z #293811679 for sale

TEL / TOKYO ELECTRON Alpha 8S-Z is a diffusion furnace and accessory for precise sample preparation and analyses. This equipment enables users to accurately prepare and perform a variety of thin-film deposition, annealing, and doping processes. The system is well suited for production, R&D, research, and experimental applications. TEL ALPHA 8SZ comprises a mainframe and a loadlock chamber. The mainframe is equipped with an 8-inch wafer Transfer-ELock that is compatible with both cassette-to-cassette and load-lock-to-load-lock operations, thereby allowing for quick and easy sample preparation. Additionally, the mainframe contains a specially designed high-frequency RF power generator, vertically-mounted oxygen supply unit, nitrogen supply machine, and exhaust tool. The loadlock chamber is designed to ensure reliable sample transfer between the Pre-Vacuum chamber, the Main chamber, and the Post-Vacuum chamber and therefore, to protect the wafer surface from any contamination. It is equipped with a 24-port backside Vent-ELock, which can be used to transfer wafers to/from the mainframe. The chamber also contains a plasma source that can be used to clean the wafer surfaces. The Vent-ELock also provides temperature measurement with thermocouple support. The wafer processing asset provides a variety of processes for thin-film deposition, annealing, and doping applications. Both thermal and plasma processes can be used for deposition, annealing, and doping. The thermal processes can use a variety of gases, including nitrogen, argon, oxygen, hydrogen, and ammonia. The automated thermal process control ensures that the highest quality thin-film deposition are achieved. The model can also be used for thermal annealing up to 1000 °C and is equipped with different furnace options, enabling a wide range of annealing temperatures and relative pressures. Additionally, the equipment is equipped with wafer electrode and heated gas evacuator for advanced wafer doping processes. TOKYO ELECTRON ALPHA 8 S-Z provides high-throughput operation, reliable sample transfer, and excellent process control. It is a high-performance system that meets the most demanding requirements for thin-film deposition, annealing, and doping processes.