Used TEL / TOKYO ELECTRON Alpha 8S-Z #9239924 for sale
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ID: 9239924
Vintage: 2000
Furnace
Polyimide cure
Quartz heater, P/N: 2187-323602-1C
PSU and UPS
2000 vintage.
TEL / TOKYO ELECTRON Alpha 8S-Z is a diffusion furnace and accessorie used in the production of semiconductor circuits. It is designed for annealing, oxidation, etching, and other processes requiring high temperatures. TEL ALPHA 8SZ has a top-loading design with an integrated equipment for controlling the atmosphere inside the furnace, which makes it suitable for use in a wide range of applications. Furthermore, the diffusion furnace is extremely reliable due to its advanced safety features, which include a dual-burner, ozone destruction system, and a protected vacuum valve. TOKYO ELECTRON ALPHA 8 S-Z is designed to process wafers of 300mm in diameter. It comes with two levels of heaters, the high-temperature zone (HTZ) and the low temperature zone (LTZ). The HTZ has a maximum temperature of 1700°C and an average uniformity of ±1°C over the entire wafer. The LTZ is used for developing processes and has a maximum temperature of 800°C. The temperature control accuracy for the HTZ and LTZ is 0.1°C. Alpha 8S-Z is equipped with advanced PID (proportional integral derivative) controllers to ensure highly precise temperature control. The completely programmable controllers use an intelligent user interface and visual alarms to keep the user informed on the process. In addition, the furnace can be remotely operated via a remote monitoring unit and be used for multiple batch processes. TEL / TOKYO ELECTRON ALPHA 8 S-Z is also equipped with an integrated single table belt internal transfer machine. This allows for quick and efficient transfer of substrates into and out of the furnace. The tool uses a travelling clamp plate design for optimal loading and unloading. This ensures that the substrates are safely transported between the loading, cooling and annealing processes. TEL ALPHA 8 S Z diffusion furnace utilizes advanced dry vacuum pump technology to provide high process repeatability and excellent process quality. The furnace is equipped with separate dry vacuum pumps for the LTZ and HTZ sections, providing greater control over vacuum conditions. Furthermore, TEL ALPHA 8 S-Z utilizes advanced ozone destruction technology to reduce the amount of ozone in the process atmosphere. This technology is based upon ceramic ozone destruction catalysts and helps to reduce the risk of ozone contamination in the processed wafers. Overall, TOKYO ELECTRON ALPHA 8SZ is an advanced diffusion furnace that is designed to be reliable and easy to use. It is optimized for a wide range of processes at both high and low temperatures, and is equipped with features such as dry vacuum pumps, ozone destruction technology, and an internal transfer asset, to ensure greater user convenience and increased process quality.
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