Used TEL / TOKYO ELECTRON Alpha 8S-Z #9297064 for sale

TEL / TOKYO ELECTRON Alpha 8SCN diffusion furnace and its accessories can be used for a range of semiconductor and MEMS device fabrication processes. The equipment can accurately and precisely control time, temperature, and atmosphere within the chamber for optimum process results. It is capable of achieving temperatures up to 1280°C, and offers several options for low temperature, rapid thermal annealing (RTA), and high temperature capabilities. TEL Alpha 8SCN offers a one-touch, user-friendly HMI (Human Machine Interface) that simplifies operation, as well as a fast low-temperature ramp rate capability for unparalleled throughput and process optimization. The uniform temperature distribution within the furnace allows for uniformity of process results in a very small area. This uniform temperature distribution is achieved in an efficient manner, allowing the system to be used with lower operating costs than many similar systems. The unit comes with a variety of accessories to ensure safe, precise, and repeatable measurements, such as an In-Situ Oxygen Measurement Machine (FIMOS-2) that continuously monitors the oxygen level inside the chamber. In addition, integrated IT solutions such as the Coater ERDR (Edge Retention Device) and ECLIPSE data acquisition tool allow for real-time analysis of the process parameters. TOKYO ELECTRON Alpha 8SCN is designed with a large internal capacity, allowing for the loading of substrates into chip carriers which can then be loaded into the furnace by a wafer cassette shaker. Other standard features include an electronic pressure valve, a shutter safety feature that prevents substrate loss by reversing the valve, an automatic cooling fan, and a low-noise environmental asset. This ensures safe and efficient operation for extended periods of time. Alpha 8SCN is an ideal machine for many of today's semiconductor and MEMS applications, and is designed with advanced features to ensure the highest quality results. Its precise temperature control, fast ramp rate capability, real-time measurement and analysis, and integrated IT solutions make it a reliable and efficient choice for many technical processes.