Used TEL / TOKYO ELECTRON Alpha 8S ZVF #9227418 for sale

TEL / TOKYO ELECTRON Alpha 8S ZVF
ID: 9227418
Wafer Size: 8"
VF LPCVD Poly system, 8".
TEL / TOKYO ELECTRON Alpha 8S ZVF is an advanced diffusion furnace and accessory, specifically used for processing wafers in the semiconductor industry. TEL Alpha 8S ZVF equipment provides excellent temperature uniformity, high throughput rates, and improved wafer yields during CVD and diffusion processes. Features of TOKYO ELECTRON Alpha 8S ZVF system include a dual chamber design for high-temperature CVD, a high-pressure, high-temperature process chamber, and an improved environment chamber for improved wafer throughput. Alpha 8S ZVF also includes an extra inline furnace, an optional Ultra High Vacuum (UHV) performace module, and is designed for improved gas distribution for improved overall process control. The Dual Chamber Design of TEL / TOKYO ELECTRON Alpha 8S ZVF enables two-step process flow with high-temperature CVD and Rapid Thermal Processing (RTP) or Rapid Thermal Annealing (RTA) modules, which allows for enhanced step coverage, improved process uniformity, and higher throughput rates. The dual chamber design also includes a quartz-electric showerhead that evenly distributes processing gases, and also includes a low-power wafer heating element for improved safety. TEL Alpha 8S ZVF's high-pressure, high temperature module ensures that the contact temperature is maintained, while providing excellent material uniformity and a high throughput of wafers. This module is designed to handle pressures up to 600 torr and temperatures up to 1400 degrees Celsius, and also includes a dual quartz-carbon sheet zone, an improved quartz-carbon gold-coated furnace, and a closed-loop gas distribution unit. Additionally, TOKYO ELECTRON Alpha 8S ZVF furnace is designed for improved process control and safety, providing users with accurate gas temperature control and a greater process window. Alpha 8S ZVF's optional Ultra High Vacuum (UHV) performance module provides an even lower pressure environment for plasma and vacuum-assisted processes, enabling low-pressure, ultra-high-temperature processes up to 1400 degrees Celsius. This module also features a single quartz element design, a dual quartz-electric showerhead to evenly distribute processing gases, and a low-power wafer heating element for improved safety. TEL / TOKYO ELECTRON Alpha 8S ZVF machine is designed to provide the semiconductor industry with excellent temperature uniformity, high throughput rates, and improved wafer yields during CVD and diffusion processes. The tool's Dual Chamber Design, high-pressure, high-temperature module, and optional UHV module provide enhanced step coverage, improved process uniformity, and higher throughput rates, ensuring increased wafer yields and improved process control.
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