Used TEL / TOKYO ELECTRON Alpha 8S-ZVN #9227414 for sale

TEL / TOKYO ELECTRON Alpha 8S-ZVN
ID: 9227414
Wafer Size: 8"
VF LPCVD System, 8" Nitride: AA.
TEL / TOKYO ELECTRON Alpha 8S-ZVN is a diffusion furnace and accessories used to manufacture monolithic integrated circuits on silicon wafers. This machine offers up to 12 independently programmable process tubes, and is capable of executing a variety of gas-phase processes including thermal oxide, nitride, doped oxides, and dopant drive-in. TEL ALPHA-8S-ZVN is equipped with a quartz tube chamber offering superior thermal performance, and is capable of achieving ultra-high temperatures over 1200°C with precise temperature control. To ensure precise uniformity for the diffusion processes, each tube on TOKYO ELECTRON ALPHA 8S ZVN is equipped with a precise dual zone temperature control system, with independent zone temperatures, pre-heating, ramp-up, and cool-down temperature settings. This provides a high degree of uniformity and repeatability, allowing for a precise manufacturing process. Alpha 8S-ZVN is also fitted with an automated oxidant generation system which accurately and consistently maintains the oxygen concentration in the diffusion chamber, allowing a uniform oxide thickness on the wafer. The machine is also equipped with a unique RFID-enabled wafer loading subsystem which securely labels and tracks every wafer throughout the diffusion process, allowing for easy replication and quicker wafer loading times. TEL Alpha 8S-ZVN is also able to execute a range of standard dopant drive-in processes, including both arsenic and phosphorous. For these processes, the machine is designed with capable of generating nitrogen or argon/hydrogen mixtures, allowing for safer and more efficient dopant drive-in. The machine also offers a range of post-drive in and clean-up options, including simultaneous vinyltrimethoxy silane (VTMS) and argon/hydrogen plasma. TEL / TOKYO ELECTRON ALPHA 8S ZVN is a highly reliable and precise diffusion furnace and accessories, ideal for the manufacture of high-density monolithic integrated circuits. With its numerous safety features, reliable temperature control system and automated wafer loading subsystem, it is a powerful tool for manufacturing advanced integrated circuits.
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