Used TEL / TOKYO ELECTRON Alpha 8S-ZVN #9227416 for sale

TEL / TOKYO ELECTRON Alpha 8S-ZVN is a diffusion furnace specialized for semiconductor device fabrication. This diffusion furnace is designed for high throughput and improved productivity with an adjustable temperature range from 150°C to 1000°C. It is constructed with a quartz tube chamber, diffusion features, and an integrated process chamber to ensure minimal thermal losses. TEL ALPHA-8S-ZVN diffusion furnace is equipped with a high-efficiency halogen lamp light source and high-precision, eight-zone pyrometer to accurately monitor and control temperature within the processing tube. It is integrated with an improved protective gas system and a unique gas thermal cycle which reduces energy consumption while increasing reliability and safety. Additionally, TOKYO ELECTRON ALPHA 8S ZVN provides an improved cooling cycle and rapid heating processes for uniform heating. TEL ALPHA 8S ZVN diffusion furnace also features a unique, advanced control mechanism which utilises AI to optimize the wafer temperature and improve process uniformity. This feature also helps to shorten thermal cycle times and maintain the required temperature stability throughout the diffusion process. Additionally, ALPHA 8S ZVN employs an enhanced recipe system for optimized diffusion recipes. Furthermore, the furnace provides an operator-friendly interface with a 7.0-inch colour LCD touch screen which provides excellent process visibility with both current and historical process data. TEL / TOKYO ELECTRON ALPHA-8S-ZVN is an ideal solution for involved in the fabrication of complex and specialized semiconductor devices such as Flash memory, D-RAMs, and Logic ICs. Specifically, the diffusion furnace is suitable for a range of implementation such as CMOS, IFerrite, Flash MOS memory, SiGe HBT, SiGeCGFET, and GaN HBT processes. TOKYO ELECTRON Alpha 8S-ZVN is highly reliable and built with durable construction to withstand harsh processing environments. Overall, ALPHA-8S-ZVN is an advanced diffusion furnace designed to provide high-temperature, high-throughput thermal processing with improved uniformity and process yield. The furnace is equipped with advanced features and controls designed to ensure comprehensive and efficient semiconductor device fabrication processes.