Used TEL / TOKYO ELECTRON Alpha 8S #293759912 for sale

TEL / TOKYO ELECTRON Alpha 8S is a diffusion furnace and accessory designed for the semiconductor deposition process used by professional manufacturing uses. TEL ALPHA-8S utilizes a ceramic chamber, which allows a continuous process from incoming to outgoing furnishings. This ceramic chamber works in association with an eductor gas delivery equipment for improved gas flow for efficient transfer and cooling of mixtures. An RF Graphite susceptor protect the package from thermal degradation, as well as limit contact between the substrate and its surroundings. This susceptor is also designed to minimize the levels of static electricity present in the furnace. TOKYO ELECTRON ALPHA 8 S diffusion furnace is capable of a variety of process temperatures, ranging from 100°C to 1100°C. With a heating plate temperature of up to 1440°C, the furnace is able to adapt to various process parameters. This furnace utilizes an in-situ chamber inerting capability with an automated methane hardware control system, designed to provide improved process control to minimize cassette-to-cassette variations for optimized deposition processes. TEL / TOKYO ELECTRON ALPHA 8 S is equiped with robust safety features, such as pressure-sensing mechanisms, to protect the furnace from potential problems. The pressure sensing automatically increases or decreases the supply of gas, ensuring a stable atmosphere throughout the unit. It also includes a temperature based alarm machine which can be connected to alarms outside the furnaces and triggered in response to any potential problems. Alpha 8S is also equipped with an EMI shiedl generator to avoid electromagnetic interference. It is specifically suited to semiconductor processing, ensuring heat distribution consistency and high-quality products. Its improvement over earlier models includes features such as dual diagnostics control and aluminum-oxide insulation in the outer chamber. Overall, TEL / TOKYO ELECTRON ALPHA-8 S is a reliable and efficient diffusion furnace, designed for use in strengthening the process of semiconductor deposition. Its ceramic chamber and RF Graphite susceptor limit the contact between the supplier and its surroundings, while the EMI Shield generator and pressure-sensing mechanisms provide additional protection, making it safe and easy to use. TEL ALPHA 8 S is a great choice for those looking for a steady and reliable process.