Used TEL / TOKYO ELECTRON Alpha 8S #293769821 for sale

ID: 293769821
Wafer Size: 8"
Vintage: 1994
Furnace, 8" 1994 vintage.
TEL / TOKYO ELECTRON Alpha 8S is a diffusion furnace and accessories that offer excellent performance for high-precision, intensive processes. This equipment is primarily used for ion implantation and diffusion processes in semiconductor and opto-electronics industries. It is specifically designed for applications requiring the highest level of performance and precision. TEL ALPHA-8S is a fully integrated diffusion furnace. It features a dual-duty forced convection equipment, with lower temperature regions for better uniformity, and higher temperature regions for rapid heating and cooling functions. The temperature range for this system is between a low of 900°C and high of 1050°C. TOKYO ELECTRON ALPHA 8 S is equipped with electronic process control, allowing precise PID and model control even in the most challenging environments. It also has the ability to precisely control gas and oxygen levels using advanced algorithms and deposition methods. In addition, this unit employs sensor-controlled heaters, allowing for precise heating and cooling functions. TEL Alpha 8S features the latest innovation in control technology. It is equipped with an advanced command-and-control intelligence module, allowing for fast and easy programming and commands. The machine also offers an internal memory and a graphical interface for quicker and easier operation. ALPHA-8 S is designed to enhance the versatility and capability of the diffusion process. With its robust physical design and innovative technology, this tool provides increased process speed, improved performance and enhanced process uniformity. Additionally, this advanced asset provides accurate and reliable temperature settings, enabling precise results and repeatability. ALPHA-8S is the perfect choice for the most demanding, high-precision and intensive processes. With its excellent performance and reliable results, this model is the preferred choice for ion implantation and diffusion processes in the semiconductor and opto-electronics industries.
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