Used TEL / TOKYO ELECTRON Alpha 8S #293775114 for sale

TEL / TOKYO ELECTRON Alpha 8S
ID: 293775114
Furnace.
TEL / TOKYO ELECTRON Alpha 8S is a diffusion furnace and an associated accessory specifically designed for the deposition of metal on a silicon wafer. TEL ALPHA-8S is a metalorganic chemical vapor deposition (MOCVD) furnace and utilizes an ultra-high vacuum equipment. It features three independent gas lines and offers independent temperature control. TOKYO ELECTRON ALPHA 8 S is one of the most reliable MOCVD systems available and is often used in the production of III-V compound semiconductor layers such as gallium arsenide, indium phospeides, and indium antimonide. TEL ALPHA-8 S features an advanced Ultra High Vacuum (UHV) system, with a vacuum range of 10-11 Torr. At this level of vacuum, no oxygen contamination is present and yields higher quality epitaxial layers with greatly reduced material consumption. It is also equipped with an advanced quartz crystal microbalance (QCM) to control process gases at the molecular level and prevent unintentional escape of process gases. Additionally, TEL ALPHA 8 S is able to process up to three wafers at the same time, allowing for greater production efficiency. TEL / TOKYO ELECTRON ALPHA 8 S diffusion furnace has a comprehensive set of safety features. Features such as a mirror heating unit with enhanced heat dissipation and quartz locking mechanism help to prevent slag formation, while the lid safety operation automatically stops the process if the door opens. TEL / TOKYO ELECTRON ALPHA-8S is also equipped with an anti-reflection coating (ARC) machine, which prevents optical interference between the mirrors and the sample. In terms of hardware and external devices, TOKYO ELECTRON ALPHA-8S is compatible with a number of accessories such as hydrochloric or nitrogen gas supply systems, robotics, gas flow controllers and remote operation systems. Alpha 8S is also equipped with a fast and accurate quartz thermometer to measure the wafer temperature and a highly sensitive infrared reflecting camera to monitor the wafer's surface For safety and control operation, ALPHA-8 S employs freely programmable warning systems and a touch-screen graphical user interface tool (GUI). In conclusion, ALPHA-8S is an advanced diffusion furnace with a vast range of hardware and software features that allow it to be used in a variety of fabrication processes. With its advanced UHV asset, it is ideal for the deposition of high-quality epitaxial layers and its safety features ensure safe and reliable operation. TOKYO ELECTRON Alpha 8S is an excellent choice for use in III-V compound semiconductor layers such as gallium arsenide, indium phosphide and indium antimonide layer fabrication.
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