Used TEL / TOKYO ELECTRON Alpha 8S #9060551 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9060551
Wafer Size: 8"
Vintage: 1993
Nitride Furnace, 8"
Interface cassette, 8"
100 wafer load size with 150 upgrade & end-effector available
Facilities entry at bottom
Wide body style
Right sided
Brooks 5964 MFCs
MFC 1 - 20 slm N2
MFC 2 - 500 sccm N2
MFC 3 - 3 slm N2
MFC 4 - 100 sccm Ar
MFC 5 - 2 slm NH3
MFC 6 - 500 sccm SiH2Cl2
Edwards QDP80 /QMB1200 Pump stack
SOLA UPS
NBest battery back up
Heat traced exhaust line with system
MKS heated throttle valve model 653B-13162
Main controller is TS 4000Z
1000 C heater core
Lip seal: No
Inner T / C8
Linear aligner UP/DOWN axis slide motions
Single or 5 wafer loading
Variable pitch: No
Tube, external Nitride 07-00106
Tube, internal Nitride 07-00218
Injector #1 Nitride 12mm 07-00219
Injector #2 Nitride 45mm 07-0220
Injector #3 Nitride 500mm 07-00221
Cover, cap Nitride 07-0225
Pedestal, Nit / All / Ann 07-00227
Pedestal cover, Nit / Al / Ann 07-00227
Boat, Sic 07-00124-00
Process tube, 16"
Rapid cooling
3 Phase
Voltage: 208V
60 Hz
SMIF loader: No
N2 purged loadlock: No
WIP Carrier storage capacity: 8
End-effector: 1 or 5 Fixed Pitch
Boat rotation: Yes
Furnace:
Temperature controller: Model 120
(5) Zones
Heater type: VMM-40-004
Rapid cooling configuration: Yes
Tube seal configuration: O-ring
Temperature control methodology: PID
Thermocouple type: R
Process gas control system:
General
External torch: No
H2 Burn off: No
Bubbler system: No
Gas leak dectection: No
Moisture sensor: No
Process gases (LPCVD)
MFC1 Model/type: BROOKS 5964
Process gases: N2
Flow rate: 20 SLM
MFC2 Model/type: BROOKS 5964
Process gases: N2
Flow rate: 500 SCCM
MFC3 Model/type: BROOKS 5964
Process gases: N2
Flow rate: 3 SLM
MFC4 Model/type: BROOKS 5964
Process gases: Ar
Flow rate: 100 SCCM
MFC5 Model/type: BROOKS 5964
Process gases: NH3
Flow rate: 2 SLM
MFC6 Model/type: BROOKS 5964
Process gases: SiH2Cl2
Flow rate: 500 SCCM
MFM1 Model/type: BROOKS 5964
Process gases: SiH2Cl2
Flow rate: 500 SCCM
Vacuum pump: EDWARDS
Blower capacity: QMB1200
Dry pump capacity: QDP80
Pressure controller: Varian-TEL LR300
Process manometer: 10 Torr MKS 625A
Pressure differential manometer: 1000 Torr MKS 625A
Pump manometer: 100 Torr MKS 625A
Inline coldtrap: yes
1993 vintage.
TEL / TOKYO ELECTRON Alpha 8S is a high-performance diffusion furnace and accessories designed to enable precision processing of semiconductor wafers, thin film devices, MEMS, optoelectronic, and other such electronic devices. With TEL ALPHA-8S, even the most advanced fabrication processes can be achieved with remarkable accuracy and high throughput. TOKYO ELECTRON ALPHA 8 S is equipped with a compact vacuum chamber, which has a volume of 95 liters, and a six-segmented quartz chamber liner for superior temperature uniformity. This design allows for quick and precise temperature control up to 1,400°C, with a temperature uniformity of ± 1.2°C. Additionally, its forced-air-cooled heater equipment is designed to maintain and optimize performance for long-term use. Alpha 8S is equipped with a high-precision gas distribution system, which is capable of providing a multitude of gases—including Argon, Helium, Nitrogen, and Oxygen—as well as reactive gases like Hydrogen and Deuterium. This gas delivery unit is crucial for most diffusion processes, as it ensures consistent and reliable delivery of all gases to the target areas. TEL / TOKYO ELECTRON ALPHA 8 S is also equipped with a variety of advanced features designed to ensure safety and reliability. These features include an ozone monitor to detect ozone concentrations at any point in the furnace, high-speed pressure control, as well as a high-speed overcurrent monitoring machine for preventing over-temperature damage, and an infrared heater temperature sensor for monitoring and controlling the temperature of the heating chamber. TEL ALPHA-8 S is designed for reliable operation in a cleanroom environment, with features such as a protective housing that prevents contamination of the process chamber, and an optical monitoring tool that detects open/closed doors and windows. Lastly, TOKYO ELECTRON ALPHA-8S is equipped with a data logging asset, which is capable of recording temperatures, pressures, process times, and other critical process parameters. This data can be accessed remotely, and saved in PC files for later analysis. In summary, TOKYO ELECTRON Alpha 8S is an advanced diffusion furnace and accessories designed for precision processing of a variety of semiconductor and electronic device types. With its compact vacuum chamber, temperature uniformity, high-precision gas delivery model, and advanced safety features, TEL / TOKYO ELECTRON ALPHA-8 S is well-suited for high-performance fabrication processes.
There are no reviews yet