Used TEL / TOKYO ELECTRON Alpha 8S #9060551 for sale

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ID: 9060551
Wafer Size: 8"
Vintage: 1993
Nitride Furnace, 8" Interface cassette, 8" 100 wafer load size with 150 upgrade & end-effector available Facilities entry at bottom Wide body style Right sided Brooks 5964 MFCs MFC 1 - 20 slm N2 MFC 2 - 500 sccm N2 MFC 3 - 3 slm N2 MFC 4 - 100 sccm Ar MFC 5 - 2 slm NH3 MFC 6 - 500 sccm SiH2Cl2 Edwards QDP80 /QMB1200 Pump stack SOLA UPS NBest battery back up Heat traced exhaust line with system MKS heated throttle valve model 653B-13162 Main controller is TS 4000Z 1000 C heater core Lip seal: No Inner T / C8 Linear aligner UP/DOWN axis slide motions Single or 5 wafer loading Variable pitch: No Tube, external Nitride 07-00106 Tube, internal Nitride 07-00218 Injector #1 Nitride 12mm 07-00219 Injector #2 Nitride 45mm 07-0220 Injector #3 Nitride 500mm 07-00221 Cover, cap Nitride 07-0225 Pedestal, Nit / All / Ann 07-00227 Pedestal cover, Nit / Al / Ann 07-00227 Boat, Sic 07-00124-00 Process tube, 16" Rapid cooling 3 Phase Voltage: 208V 60 Hz SMIF loader: No N2 purged loadlock: No WIP Carrier storage capacity: 8 End-effector: 1 or 5 Fixed Pitch Boat rotation: Yes Furnace: Temperature controller: Model 120 (5) Zones Heater type: VMM-40-004 Rapid cooling configuration: Yes Tube seal configuration: O-ring Temperature control methodology: PID Thermocouple type: R Process gas control system: General External torch: No H2 Burn off: No Bubbler system: No Gas leak dectection: No Moisture sensor: No Process gases (LPCVD) MFC1 Model/type: BROOKS 5964 Process gases: N2 Flow rate: 20 SLM MFC2 Model/type: BROOKS 5964 Process gases: N2 Flow rate: 500 SCCM MFC3 Model/type: BROOKS 5964 Process gases: N2 Flow rate: 3 SLM MFC4 Model/type: BROOKS 5964 Process gases: Ar Flow rate: 100 SCCM MFC5 Model/type: BROOKS 5964 Process gases: NH3 Flow rate: 2 SLM MFC6 Model/type: BROOKS 5964 Process gases: SiH2Cl2 Flow rate: 500 SCCM MFM1 Model/type: BROOKS 5964 Process gases: SiH2Cl2 Flow rate: 500 SCCM Vacuum pump: EDWARDS Blower capacity: QMB1200 Dry pump capacity: QDP80 Pressure controller: Varian-TEL LR300 Process manometer: 10 Torr MKS 625A Pressure differential manometer: 1000 Torr MKS 625A Pump manometer: 100 Torr MKS 625A Inline coldtrap: yes 1993 vintage.
TEL / TOKYO ELECTRON Alpha 8S is a high-performance diffusion furnace and accessories designed to enable precision processing of semiconductor wafers, thin film devices, MEMS, optoelectronic, and other such electronic devices. With TEL ALPHA-8S, even the most advanced fabrication processes can be achieved with remarkable accuracy and high throughput. TOKYO ELECTRON ALPHA 8 S is equipped with a compact vacuum chamber, which has a volume of 95 liters, and a six-segmented quartz chamber liner for superior temperature uniformity. This design allows for quick and precise temperature control up to 1,400°C, with a temperature uniformity of ± 1.2°C. Additionally, its forced-air-cooled heater equipment is designed to maintain and optimize performance for long-term use. Alpha 8S is equipped with a high-precision gas distribution system, which is capable of providing a multitude of gases—including Argon, Helium, Nitrogen, and Oxygen—as well as reactive gases like Hydrogen and Deuterium. This gas delivery unit is crucial for most diffusion processes, as it ensures consistent and reliable delivery of all gases to the target areas. TEL / TOKYO ELECTRON ALPHA 8 S is also equipped with a variety of advanced features designed to ensure safety and reliability. These features include an ozone monitor to detect ozone concentrations at any point in the furnace, high-speed pressure control, as well as a high-speed overcurrent monitoring machine for preventing over-temperature damage, and an infrared heater temperature sensor for monitoring and controlling the temperature of the heating chamber. TEL ALPHA-8 S is designed for reliable operation in a cleanroom environment, with features such as a protective housing that prevents contamination of the process chamber, and an optical monitoring tool that detects open/closed doors and windows. Lastly, TOKYO ELECTRON ALPHA-8S is equipped with a data logging asset, which is capable of recording temperatures, pressures, process times, and other critical process parameters. This data can be accessed remotely, and saved in PC files for later analysis. In summary, TOKYO ELECTRON Alpha 8S is an advanced diffusion furnace and accessories designed for precision processing of a variety of semiconductor and electronic device types. With its compact vacuum chamber, temperature uniformity, high-precision gas delivery model, and advanced safety features, TEL / TOKYO ELECTRON ALPHA-8 S is well-suited for high-performance fabrication processes.
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