Used TEL / TOKYO ELECTRON Alpha 8S #9060562 for sale
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ID: 9060562
Vacuum anneal furnace, 8"
8" Interface cassette
Through wall installation
H2 and N2 Anneals
Brooks 5964 MFCs
MFC 1 - N2 10 slm
MFC 2 - N2 10 slm
MFC 3 - H2 5 slm
MFC 4 - H2 10 slm
MFC 5 - H2 5 slm
(2) Hydrogen detectors
(100) Wafer loads
1200C Heat range core
Rapid cool
Lipseal, Inner T/C, linear aligner up / down axis side motions
No variable pitch: Single or (5) wafer
16" Process tube
TS-4000Z Controller
Temperature controller: Model 121
Boat, CLN OX - 07-00202
Cover pedestal - 07-00204
Pedestal - 07-00205
PFA tube (6.35x4.35x1.0T)
3 Phase
Voltage: 208V
Direction: Left
Load station:
(2) I/O Ports
(2) Cassette arms
SMIF Loader: No
N2 Purged loadlock: No
WIP Carrier storage capacity: 8
End effector: 1 or 5, Fixed pitch
Wafer spacing: Fixed
Boat rotation: No
Furance:
(5) Zones
Heater type: VMM-35-001
Rapid cooling configuration: No
Tube seal configuration: O-ring
Temperature control methodology: PID
Thermocouple: Type R
External torch: No
H2 Burn off: No
Bubbler system: No
Gas leak detection: Yes (H2 and O2)
Moisture sensor: No
Process gases (atmospheric): N2, H2
MFC1 Model / type: Brooks 5964
Process gases: N2
Flow rate: 20 SLM
MFM1: Model / type: Brooks 5964
Process gases: N2
Flow rate: 10 SLM
MFC2 Model / type: Brooks 5964
Process gases: H2
Flow rate: 5 SLM
MFC3 Model / type: Brooks 5964
Process gases: H2
Flow rate: 10 SLM
MEC4 Model / type: Brooks 5964
Process gases: H2
Flow rate: 5 SLM
Process pressure control system:
Vacuum pump: EDWARDS QDP80
Pressure controller: VARIAN LR300
Process manometer: MKS 625A 100
Pressure differential manometer: MKS 625A 1000
Inline cold trap: No
Inline particle trap: No
Manuals.
TEL / TOKYO ELECTRON Alpha 8S is a high-performance diffusion furnace equipment designed for production of MEMS, semiconductor, flat panel displays, and metal-oxide. It features a self-contained furnace chamber with an automated multi-step process that is optimized for advanced thermal process parameters. It utilizes a computer-controlled process to control all heating and cooling operations of the furnace chamber. TEL ALPHA-8S is equipped with a quartz deposition exposed manual and auto crucibles, infrared emitters, variable air cooling, and other advanced process settings, as well as TEL patented 'Lone Beacon' heating system which directs RF energy into the chamber to rapidly and precisely heat or cool the target load. Different process variables such as temperature, time, pressure, and atmospheric gases can be adjusted according to specific applications requirements. This cutting edge technology provides unsurpassed performance for critical thermal processing applications, allowing users to take advantage of advanced process settings for high yield and high-precision outcomes. TOKYO ELECTRON ALPHA 8 S has an integrated exhaust unit to remove harmful gases and air-borne particles, as well as adjustable features to accommodate different process applications including metal-oxide and silicon wafer processing. ALPHA 8 S is one of the most reliable and efficient systems available, with 100% test coverage providing unsurpassed quality results. Temperature uniformity is benchmark-setting level, reaching +/- 5°C as well as precise pressure control with 0.01 kPa resolution. Its intuitive user interface makes it easy to learn and utilize, and the digital controls allow for easy process optimization. TEL / TOKYO ELECTRON ALPHA 8 S also offers a number of safety-based features, such as open-touch interlocks, automatic shut-down when excessive temperature or pressure is detected, and auto-monitored pre-heating and cool-down cycling. This versatile machine is designed to meet stringent industrial standards, making it an ideal choice for advanced thermal processing.
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