Used TEL / TOKYO ELECTRON Alpha 8S #9245683 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9245683
Vintage: 2000
Furnace
Layout type: U/Box type (L)
System hand: LL
N2 Load lock
Heater type: WMM-40-101 Mid temperature
Torch heater
TEL Integrated SMIF
Process gasses:
Gas 1: N2 (20 SLM)
Gas 2: N2 (5 SLM)
Gas 3: N2 (1 SLM)
Gas 4: NH3 (2 SLM)
Gas 5: DCS (200 SCCM)
Gas 6: O2 (2 SLM)
Gas distribution system:
Basic style: Conventional gas system
Tubing material: Stainless system
Electro-polished tube
FUJIKIN Manual valve
FUJIKIN Air operated valve
MFC: AERA
Wafer / Cassette handling:
Wafer type: 8" Semi STD-Notch
Cassette type: ENTEGRIS / XT200-01E
(25) Cassette wafers
(16) Cassette storage
1+4 Fork type / Material
Fork variable pitch
Boat / Pedestal:
(150) Production wafers
Boat rotation
System controller: TS-4000Z
Signal tower
General pressure display unit: Pressure Mpa
Cabinet exhaust display unit: Kpa
Furnace temperature controller: M121
Power supply:
Voltage:
208 VAC at 3 Phase
120 VAC at 1 Phase
UPS Input / Output voltage: 120 V / 100 V
2000 vintage.
TEL / TOKYO ELECTRON Alpha 8S Diffusion Furnace is a state-of-the-art tool for semiconductor manufacturing. With a broad range of features, it provides advanced temperature uniformity and homogeneity, allowing for precise semiconductor processing. TEL ALPHA-8S can operate in either LPCVD (Low Pressure Chemical Vapor Deposition) or RPCVD (Rapid Pressure Chemical Vapor Deposition) modes. In LPCVD mode, the uniformity across wafers is ±0.5°C, providing excellent repeatability and low temperature gradients. In RPCVD mode, the uniformity across wafers is ±0.2°C, providing even more precise control. TOKYO ELECTRON ALPHA 8 S also features a wide range of temperatures from 150°C to 1050°C, allowing for a variety of processes. In addition to uniformity, ALPHA-8 S also provides fast temperature ramping times. Its hotwall design provides large convection cells for rapid heating and cooling, allowing for fast processing speeds. Alpha 8S can reach target temperature in less than 60 seconds, eliminating the need to cool the chamber down manually. TEL / TOKYO ELECTRON ALPHA 8 S also provides a variety of accessories to facilitate semiconductor manufacturing. These include high or low pressure gas manifold systems, quartz pressure chambers, LPCVD reaction tanks, and quartz muffle systems to avoid contact with hot surfaces. ALPHA 8 S also has gas-tight feed-throughs for introducing reactant gases into the system. This enables reaction rates of up to 55ccmand pressures up to 10 bar. TEL Alpha 8S also features an automated wafer handling system to speed up the loading and unloading process. This system consists of a robotic arm with a pre-automated hand for simple and repeatable loading and unloading of wafers. TOKYO ELECTRON Alpha 8S is an ideal tool for precise and efficient semiconductor processing. it offers excellent temperature uniformity and homogeneity along with fast temperature ramping times, and a robust selection of accessories for reliable and controlled semiconductor manufacturing.
There are no reviews yet