Used TEL / TOKYO ELECTRON Alpha 8S #9257610 for sale

TEL / TOKYO ELECTRON Alpha 8S Diffusion Furnace and its accessories are used in semiconductor fabrication plants for the generation of thermal and electrical profiles to allow for the diffusion of dopants into the wafers being processed. TEL ALPHA-8S features a quartz tube outer vessel encased in a temperature-controlled oven, a dual infrared lamp heater for uniform firing of wafers, and a vertical lift mechanism for easy wafer removal and loading. Additionally, the diffusion furnace contains a variety of sensors and controls to provide precise control over the thermal parameters of the process. The inner vessel of TOKYO ELECTRON ALPHA 8 S is made from high-purity quartz to resist thermal shock and handle the high temperatures reached by the diffusion furnace during processing. This quartz material is cleaned and inspected regularly for any signs of contamination or breakdown in structure. The dual infrared lamps are precisely aligned and adjusted to direct thermal radiation at the exact location and angle desired, aiding in uniform thermal heating of the wafers. Control over the thermal parameters is further aided by the various temperature sensors built into ALPHA-8 S. These sensors track the exact temperature of the wafers at all times, allowing for tight control over the process. The vertical lift mechanism also adds further to the control over the process by allowing for precise and efficient wafer loading/unloading. Accessories supplied with TOKYO ELECTRON Alpha 8S Diffusion Furnace include a crucible heater, quartz chips, and an MC Switch box. The crucible heater is designed to heat the crucible that is used to contain the dopant gases during processing. The quartz chips are used to maintain a uniform temperature throughout the chamber by aiding in heat transfer and insulating the walls. The MC Switch Box is used to provide precise tempo control over the thermal and electrical processes needed for diffusion. Overall, TEL / TOKYO ELECTRON ALPHA-8S Diffusion Furnace and its accessories present a highly reliable and accurate system for dopant diffusion into wafers. The temperature-resistant quartz components and attendant sensors allow for tight control over the process, as does the precise alignment of the dual infrared lamps and the vertical lift mechanism. The accessories supplied with the system provide a further level of control and efficiency that aid in optimizing the diffusion process.