Used TEL / TOKYO ELECTRON Alpha 8S #9282234 for sale

TEL / TOKYO ELECTRON Alpha 8S is an advanced diffusion furnace and accessorie designed to provide researchers with a cost-efficient solution for high-precision diffusion processes. It is suitable for ultra-fine controlled processes of SOI (Silicon-on-Insulates) substrates and has been a reliable tool for many laboratories for many years. TEL ALPHA-8S has an automatic sliding thermal insulation gas cylinder which improves process stability and lowers temperature control uncertainty. The Nitrogen-Argon gas system can generate up to 2 atmospheres of gas pressure over a range of furnaces. This is beneficial due to the increased atmospheric stability that is needed when working with delicate substrates. It is equipped with 16 manually adjustable heaters (KS-16 model only) which offer precise temperature control over the entire area of the processing chamber as well as other advanced features. To provide maximum flexibility to the user, TOKYO ELECTRON ALPHA 8 S system is fully programmable with two proprietary programs. These programs allow for the setup of a highly detailed and accurate process based on a variety of parameters such as temperature, ramp rate, chemical element concentration, and atmosphere. Additionally, the furnace's open-ended design allows for custom bath creation and quick reflowing of tin and gold times. TOKYO ELECTRON ALPHA-8 S also provides advanced diagnostics and continuous monitoring of process parameters. This ensures fault detection and protection, powerful statistical data collection, and automated temperature zoning in the event of any equipment malfunctions. These features are especially useful in controlling and validating accurate diffusion and CVD (chemical vapor deposition) processes. TOKYO ELECTRON ALPHA-8S is designed to be energy efficient, using a G-N2 electrical system to reduce electrical consumption while maximizing yields. Belt-style transport systems provide an optimal environment for self-cleaning in order to reduce the risk of substrate contamination. Additionally, the automated filter and disk systems easily manage a range of chamber sizes from 300 x 500mm to 600 × 1200mm, providing effective and reliable operation over a wide processing area. Due to its sleek design, ergonomic interface, and long-lasting stability, TEL / TOKYO ELECTRON ALPHA-8S is a great choice for researchers in need of a cost-effective solution for reliable and precise diffusion processes. It is the perfect tool for creating high-quality products such as SOI wafers and a variety of other advanced materials.