Used TEL / TOKYO ELECTRON Alpha 8S #9383405 for sale

TEL / TOKYO ELECTRON Alpha 8S (TEL ALPHA-8S) is a diffusion furnace and accessorie designed for advanced critical level semiconductor device production. This diffusion furnace has the ability to process multiple wafers at a time, allowing for an increased throughput in production. With a low base pressure of 5x10-7 Torr, TOKYO ELECTRON ALPHA 8 S is capable of excellent process control in temperatures ranging from 180-1400ᵒ C. The process time is short, ranging from 5-90 secs, and uniformity in the wafer temperature is high, with a precision of +/-1µm/sec. The robust Feature & Advantage of this diffusion furnace are the very efficient energy transfer features with the combination of air bearing, magnetic force, high accuracy, and improved processing. TEL / TOKYO ELECTRON ALPHA 8 S offers an ultra-high nickel resistance heating system which makes it more reliable and efficient in terms of temperature control. As the thermal resistance of this system is much lower than conventional resistance heating, the actual temperature of the wafer relatively higher. This offers higher throughput, reduced processing time, and higher uniformity control. The furnace also features a host of automated and manual safety and maintenance features, such as an automated environment control with oxygen flow monitor to prevent substrate oxidation. The process station has implemented ESD protection to minimize electronic damages, as well as optimized purging and venting control for optimal gas flow and maximum cleaning. An optimized protective mechanism safeguards TEL / TOKYO ELECTRON ALPHA-8 S from any potential damages caused by vacuum leaks, over-pressure and excessive wafer load. Overall, TEL ALPHA 8 S Diffusion Furnace is an excellent choice for those looking to achieve higher productivity for critical level semiconductor device production. With its low base pressure, accurate temperature control, and optimized safety and maintenance features, TOKYO ELECTRON Alpha 8S offers superior performance for optimized yields.