Used TEL / TOKYO ELECTRON Alpha 8SE-Z #9395874 for sale
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ID: 9395874
Wafer Size: 8"
Vintage: 2001
CVD Furnace, 8"
Process: Co-SiN Low pressure CVD
Wafer shape: Notch
Wafer cassette: Plastic miraial, 8"
SMIF Interface
Cassette I/O Port / SMIF
Cassette transfer
(12) Cassette stockers
(9) Cassette stockers: I/O Side
Boat elevator: Cap rotation
Wafer transfer: 1 + 4 Pitch conversion
Pass box transfer stage
Auto shutter: Full close
Furnace body:
Heater chamber: VMM-40-101, 500 - 1000℃
Furnace stand: N2 L/L
Water cooling piping
Scavenger
Cable duct
Gas system:
Gas unit: SiN
Vacuum piping
Temperature controller unit
Analyzer unit: N2 L / L O2 Thermometer
N2 Purge box: Half size F/Box
MFC:
FC-786Y-B-TC: N2 20SLM
FC-786Y-B-TC: N2 5SLM
FC-786Y-B-TC: N2 1SLM
FC-985Y-B1: NH3 2SLM
FC-985Y-B1: SiH2Cl2, 200SCCM
SEC-7340RC-204-4CR: N2 10SLM
PCV-1000-3C
FC-772C-6V: N2 200SLM
MFM: FM-865-B1-TC: SiH2Cl2 200SCCM
FM:
FM1/2: P-821-4A-6F-V2-M-N2-30L-2M
FM3: P-821-30-6F-V2-M-N2-10L-K1.0
P-510-LO-6N-S3-N2-200L
P-510-LO-6N-S3-N2-100L
P-823-40-6F-S2-S-N2-60L-SP
Control system:
WAVES
M560 Temperature controller
Gas flow chart panel with remote
Man machine interface with remote
Signal tower
2001 vintage.
TEL / TOKYO ELECTRON Alpha 8SE-Z is a diffusion furnace and accessories for various semiconductor manufacturing processes. This diffusion furnace is a fully automated, high-temperature, gas-fired furnace designed to deliver precise temperature control and uniformity. The advanced thermal structure provides uniform temperature distributions over the entire heating zone to achieve homogenous and precise results. The temperature range of TEL ALPHA 8SEZ is between 300°C and 1350°C with a maximum temperature variation of ±4.°C. This furnace is designed for uniform heating along the entire vertical slice of the semiconductor substrate with the help of an array of heated elements. The furnace is equipped with several features such as an innovative thermal design, a high-performance gas supply equipment, an advanced control system, and a tailor-made peripheral equipment. These features contribute to the furnace's high process throughput and repeatability. The gas supply unit is designed to provide optimized gas mixing and reduction of the thermal shock on heated elements due to rapid changes in gas composition. This makes TOKYO ELECTRON ALPHA-8SE-Z ideal for a variety of thermal processes from annealing to diffusion. An advanced control machine allows for precise temperature control with a synchronization between heating and cooling phases. The control tool can also be customized for the user's specific needs, such as automated process tuning and recipe optimization. The tailor-made peripheral equipment allows for quick and easy integration of the furnace into existing production lines. In addition to its exceptional thermal performance, Alpha 8SE-Z is designed to meet safety standards with several built-in safety systems and a explosion-proof structure. It is also equipped with integral Faraday Cage, Resistance Measurement Unit (RMU) and Magnetic Core Sensor (MSC) to protect the microchip from external magnetic interference. Overall, TEL / TOKYO ELECTRON ALPHA 8 SE Z is an industry-leading diffusion furnace designed to deliver precise temperature control and uniformity for various semiconductor processes. With its high performance, safety standards and integral accessories, ALPHA-8SE-Z is a great choice for any semiconductor manufacturing facility looking for reliable diffusion furnace products.
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