Used TEL / TOKYO ELECTRON Alpha 8SE #122707 for sale
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ID: 122707
Wafer Size: 8"
Vintage: 2007
Thermal process furnace, 8"
Flat type wafer
Signal tower: (4) color
I/O type
Rapid cooling unit
Capacity: (125) wafers per batch
Controller
Waves V3.23 R001 (D01FFF-000F)
(2) HDD: 4.3 GB
TEB 408 HDMC Rev 2.0B
SVA 041
TEB 107 ECS5
DVE P750/51-TR
TEB 103 FPIF
Temperature controller: 560A
Pressure controller: CKD VEC-CP2
WVG controller: WVG-SC-010Y1B2B
Vacuum pump: Ebara A150W-T
2007 vintage.
TEL / TOKYO ELECTRON Alpha 8SE is an advanced thermal and chemical processing equipment that is used in a variety of industries for a variety of materials. It is one of the most highly advanced, leading-edge systems for processing thin films with the highest quality of precision, accuracy and reliability. TEL ALPHA-8SE is a diffusion furnace that is designed to provide a uniform processing of multiple substrates using wafer-level batch process. This system also consists of several other components that provide a number of options for an extremely flexible and accurate thin-film deposition and plasma etching. TOKYO ELECTRON ALPHA-8 SE diffusion furnace comes with a semiconductor process chamber which is equipped with an Infra-Red Sensor (IRS) that can detect the temperature changes in the chamber. This is paired with a number of different attendant accessories, such as an S-FOC Automated Film Removal Unit, a high-efficiency particle-deposition machine and an RF platen. In addition, this tool also has additional recipes that can be saved for easier programming and repeatable processes. The high-efficiency, low-temperature-deposition asset allows for faster, uniform thin-film deposition. The RF platen allows for smooth, uniform processing of large-area substrates. TEL ALPHA 8 SE diffusion furnace utilizes dynamic gas inlet control, which helps improve uniformity in the chamber and reduce processing time. The advanced control technology ensures consistent processing regardless of wafer-type and substrate size. This model also provides outstanding throughput for wafer-level batch processing and supports up to 8 wafers, making it perfect for industrial use. In addition to the diffusion furnace, ALPHA 8 S E includes a variety of accessories, such as two remote fan-powered pedestal robots, a programmable quartz tube deposition module, a plasma etch module, as well as a variety of other tools and equipment. The two remote fan-powered pedestal robots help facilitate wafer loading and provide unmatched transfer reliability and process repeatability. The programmable quartz tube module provides uniform deposition of complex materials and freeform profiles. Finally, the plasma etch module helps to remove unwanted materials and improve process quality and uniformity. TEL ALPHA-8 SE diffusion furnace and its accompanying accessories provide an extremely flexible and accurate thin-film deposition and plasma etching equipment that can help a variety of industries gain more efficient processes and higher-quality products. This system is extremely reliable and provides high-precision processing with the highest level of accuracy. The reliability, flexibility, and accuracy that TOKYO ELECTRON ALPHA 8 SE can provide make it one of the best systems available for thermal and chemical processing.
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