Used TEL / TOKYO ELECTRON Alpha 8SE #9093709 for sale
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ID: 9093709
LPCVD DPoly furnace, 8"
Notch Type
3 Color (Y.R.G.)
I/O Type
Max 150 Wafer / 1 Batch
Configuration: Alpha-8SE
1999 vintage.
TEL / TOKYO ELECTRON Alpha 8SE is a single-wafer diffusion furnace designed for fabs seeking a cost-effective thermal processing solution that deploys horizontal single-wafer technology. The equipment features patented innovations in wafer topology, vertical heating chambers to maintain temperature uniformity, and a range of process gas capabilities. TEL ALPHA-8SE is a diffusion furnace that uses high temperature gas to oxidize or reduce wafers in a horizontal wafer setup. It includes a vertical heated chamber with an internal heating plate that can reach temperatures of up to 1400°C, with uniformity of ±2°C across the entire surface. The system's heat capacity and uniform temperature control allows for excellent thermal processing control, with process times ranging from a few seconds to several hours. TOKYO ELECTRON ALPHA-8 SE also implements the latest process gas technologies, supporting the use of Ar, H2, N2, N2O, O2, and other gases. The unit includes a multi-step gas control machine, allowing users to precisely control the gas flows and mix ratios of individual gas components. It also supports up to 8 extraction valves, allowing users to customize their diffusion recipes. For additional flexibility, TOKYO ELECTRON ALPHA 8 SE also features a wide range of accessories, including additional wafer holders, wafer handling components, a CVD back-side cooling tool, and a guaranteed processing temperature monitor. TOKYO ELECTRON ALPHA 8 S E also has computer controlled supporting facilities for maintenance, operating process, and thermal inspection and measurement. ALPHA 8 SE is a highly efficient, cost-effective diffusion solution for semiconductor manufacturers. Its flexible and reliable design can be used to process a variety of semiconductor applications, with added accuracy and customizable process recipes. Features such as the advanced gas control asset and the multiple process gas capabilities help ensure successful thermal processing while enabling consistent batch-to-batch miniaturization.
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