Used TEL / TOKYO ELECTRON Alpha 8SE #9216087 for sale
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ID: 9216087
Wafer Size: 8"
Vintage: 1997
PIQ System, 8"
General:
Heater type: VMM-40-101
SMIF / IO: Open cassette type
Process gasses:
Gas 1: MFC1 - N2 (20SLM)
Gas 2: MFC2 - N2 (30SLM)
Gas 3: MFC3 - N2 (3SLM)
Gas 4: MFC4 - O2 (10SLM)
Gas 5: MFC5 - SiH4 (200SCCM)
Gas 6: MFC6 - SiH4 (200SCCM)
Gas distribution system:
Basic style: Conventional gas system
Tubing material: Stainless steel
Tubing finish: Elctro-polished
Manual valve: FUJIKIN
Air operated valve: FUJIKIN
MFC: AERA
Wafer / Cassette handling
Wafer type: 200mm SEMI STD-Notch
(5) Fork types / Materials
Fork variable pitch
Cassette:
Type: Entergris / XT200-01E
(25) Wafers
(21) Storage cassettes
Boat / Pedestal:
(150) Production wafers
Boat rotation
System controls:
TS-4000Z
Signal tower colors: G/R/A
General pressure display: Mpa
Cabinet exhaust display: Kpa
Furnace temperature controller: M121
Host communications:
Host computer
Host computer I/F: SECS I/II (RS232)
Information transfer protocol: GEM
Equipment host I/F connection: U / Box top
Group controller: JGA
Power:
Heater: 208 V, 3 Phase, 31.6 KVA
Voltage: 208 V, 1 Phase: 2.3 KVA
Pump: 208 V, 3 phase: 12.4 KVA
1997 vintage.
TEL / TOKYO ELECTRON Alpha 8SE is a single-wafer, high-temperature diffusion furnace and accessories specifically designed for semiconductor fabrication processes. TEL ALPHA-8SE is a fully automated production furnace that is designed to meet the demanding requirements of modern semiconductor manufacturers. It features eight-zone controls that enable accurate temperature and atmosphere control in each zone and also ensures uniform temperatures throughout the process. Each of the eight zones is equipped with individually-adjustable heater power to accommodate workpieces of different sizes. TOKYO ELECTRON ALPHA-8 SE's hot zone temperature can be raised up to 1250°C, enabling it to accommodate more high-temperature diffusion processes. ALPHA 8 SE is also equipped with thermocouple position sensor technology that allows for precise temperature control. The sensor monitors the temperature of each workpiece for uniform temperature distribution. This state-of-the-art technology helps provide superior performance and reliability in the diffusion process. For maximum safety and convenience, ALPHA 8 S E features an internal pressure monitor, which allows for continuous monitoring of the process atmosphere pressure. TEL ALPHA 8 S E also features automated gas flow control to enable adjustable process atmosphere flow rates to ensure uniform temperature distribution. In addition, TEL / TOKYO ELECTRON ALPHA 8 S E offers remote process monitoring, a sophisticated interlock system, over-temperature protection, and user-friendly process program data input. ALPHA 8S-E is compatible with a wide range of semiconductor-grade specialty gases and features automatic gas line purging and flushing capabilities. It is also easy to maintain due to its sealed enclosure, improved gas flow systems, and automatic condensate removal. By utilizing Alpha 8SE, semiconductor manufacturers are able to produce highly accurate and reliable wafers. It is a durable, dependable, and efficient choice for semiconductor processes that require precise temperature and atmosphere control.
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