Used TEL / TOKYO ELECTRON Alpha 8SE #9244498 for sale

TEL / TOKYO ELECTRON Alpha 8SE is a diffusion furnace and accessory designed for the deposition of advanced semiconductor films. It is a revolutionary advanced-generation deposition equipment, combining the latest in user-friendly features with uninterrupted deposition capabilities. TEL ALPHA-8SE provides all the latest features in a small form, allowing the user to maximize their investments in both time and cost. Its small size allows for high scalability, allowing the system to fit in almost any lab environment. TOKYO ELECTRON ALPHA-8 SE comes with pre-installed software, increasing efficiency and making the entire process more intuitive. The unit also offers customizable options, allowing users to tailor the machine to their exact needs. This includes the option of multi-station integration, providing the flexibility needed when scaling up production. Additionally, Alpha 8SE features high-efficiency deposition processes, offering a broad range of films, from ultra-thin films of up to 10 nm, to thicker films of up to 500 nm. TOKYO ELECTRON ALPHA 8S-E can also manage up to 22 wafers at once, allowing for high throughput production. In addition, TEL ALPHA 8 SE diffusion furnace offers superior temperature stability and accuracy, allowing for more consistent film deposition. The thermal management tool uses a closed-loop asset, preventing loss of heat and improving uniformity and consistency. Moreover, ALPHA 8 S E diffusion furnace includes additional features, including an in-line, out-gas and hot-strip capability. This helps reduce cross contamination during deposition as well as prevent unwanted materials from being included in the film. Furthermore, TOKYO ELECTRON ALPHA 8 SE has a wide range of accessories, including load locks, aerosol and edge-bead removers, and remote monitoring options. TEL Alpha 8SE is designed for ease-of-use and unmatched flexibility, making it perfect for a variety of deposition needs. It is the perfect tool for anyone looking for a reliable and efficient solution for thin film preparation and deposition.