Used TEL / TOKYO ELECTRON Alpha 8SEi #293830601 for sale
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ID: 293830601
Wafer Size: 6"
Vintage: 2019
Furnace, 6"
Process: Poly
SECS/GEM
(5) Zones
CE Mark certified
System controller: WAVES
Temperature range: 500-1000°C
Temperature controller: 560-A
Front surface finish: White
O-Ring tube seal
Signal lamp tower
Gas leak detection
Wafer type: FLAT
Wafer handler type: 5 Fork
Fork material: Alumina
Stocker: 21 Carrier
Load size: 170
Transfer stage wafer position sensor
Fork wafer position sensor
MFC type: Horiba STEC
Pressure display units: MPA
Control pressure sensor: MKS 623B
Main valve heated lines
TORR and MPA Pressure display units
CKD-VEC-R Main valve
Cooling water connection: Bottom
Incoming gas connection: Top
Vacuum foreline: Bottom
Furnace exhaust connection: Top
Vent exhaust connection: Top
Gas unit exhaust connection: Top
Pressure relief drain: Bottom
Cabinet exhaust display units: TORR
Internal UPS
FUJI M-UPS GX100
Gas / MFC Model / Line / MFC Size
N2 / Aera / ¼” / 20 L
N2 / Aera / ¼” / 5 L x 5
SiH4 / Aera / ¼” / 500cc x 2
H2 / Aera / ¼” / 200cc x 3
0.5% BCl3/H2 / Aera / ¼” / 100cc x 3
Power supply: 120 V, 1Phase + 480 V, 3Phase
2019 vintage.
TEL / TOKYO ELECTRON Alpha 8SEi is a state-of-the-art diffusion furnace equipment designed for the high-volume production of semiconductor devices. It is a highly advanced and versatile tool that offers precise control over the diffusion process, resulting in superior device performance and yield. TEL Alpha 8SEi is equipped with cutting-edge technology and innovative features that make it a preferred choice for leading semiconductor manufacturers worldwide. One of the key features of TOKYO ELECTRON Alpha 8SEi is its unique horizontal furnace design, which allows for efficient and uniform diffusion of dopant materials onto the surface of silicon wafers. This design minimizes defects and ensures consistent device characteristics across the wafer, leading to improved yields and overall device performance. The horizontal configuration also enables easy loading and unloading of wafers, reducing downtime and increasing productivity. Alpha 8SEi is capable of handling a wide range of process gases and dopant materials, making it suitable for a variety of diffusion applications. It offers precise temperature control up to 1200°C, allowing for the customization of diffusion profiles to meet specific device requirements. The system is equipped with advanced gas flow control mechanisms and process monitoring capabilities to ensure reliable and repeatable diffusion results. In addition to its primary diffusion furnace, TEL / TOKYO ELECTRON Alpha 8SEi comes with a range of accessories and options that enhance its performance and versatility. These accessories include a dedicated gas handling unit, a computerized control interface, and advanced wafer handling mechanisms. The machine can be integrated with a range of automation solutions, such as robotic wafer transfer systems and advanced process control software, to further streamline production workflows and improve overall efficiency. TEL Alpha 8SEi is designed with a focus on safety and reliability, featuring advanced safety interlocks, over-temperature protection mechanisms, and comprehensive diagnostic tools. The tool is built to stringent quality standards and undergoes rigorous testing to ensure its durability and long-term reliability in a high-volume production environment. TEL provides comprehensive training and support services to help customers maximize the performance and efficiency of TOKYO ELECTRON Alpha 8SEi asset. Overall, Alpha 8SEi diffusion furnace model is a cutting-edge tool that offers unmatched precision, reliability, and versatility for semiconductor manufacturing applications. With its innovative design, advanced features, and comprehensive support services, TEL / TOKYO ELECTRON Alpha 8SEi is an ideal choice for semiconductor manufacturers looking to achieve high yields, superior device performance, and operational excellence in their production processes.
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