Used TEL / TOKYO ELECTRON APT-2800 #9280808 for sale

TEL / TOKYO ELECTRON APT-2800 is a diffusion furnace and accessory package used primarily in semiconductor fabrication processes for the deposition and/or dopant segregation of thin films on semiconductor wafers. It features quartz chamber construction, with a built-in wafer heater, an efficient muffle-blower design, and a direct digital process controller for precise control of temperature. The package is built to accommodate two wafer boats within its interior and incorporates an innovative gas equipment to ensure uniform film quality. TEL APT-2800 utilizes an open-loop control system for electro-thermal equilibrium to ensure accurate temperature control of the diffusion chamber, allowing for heating and cooling processes to occur quickly and efficiently. The wafer heater incorporated into the package has an adjustable range from 300 degrees Celsius to 1500 degrees Celsius, with a heating uniformity that keeps the temperature difference across adjacent wafers at less than ±4 degrees Celsius. The muffle-blower provides laminar flow of gas to ensure an even diffusion across the wafer through its adjustable air volume of 100-180 mL/min. A single control panel, configured with both TEL and JEOL unit packs, is incorporated into the unit to provide users with accurate actual-time temperature control. The control panel is also programmed with eight pre-set recipes for film deposition processes to ensure uniform process control. The innovative gas machine in TOKYO ELECTRON APT-2800 not only facilitates precise deposition of films onto wafers but also helps to reduce the amount of deposition waste. Its 400-cylinder storage capacity is capable of holding up to 500 sccm of gas for use in deposition processes, and its fast response gas flow adjustment feature provides users with complete process control. APT-2800 is designed with the safety of its users in mind, and a wide range of built-in safety features are incorporated into the package. These features include airborne material sensors, electronic temperature monitors, Level One alarms, and an automated power-off tool to prevent asset failure. In summary, TEL / TOKYO ELECTRON APT-2800 is an advanced diffusion furnace and accessory package designed to meet the needs of semiconductor fabrication processes while offering users ease-of-use and a secure atmosphere. The package is equipped with an accurate electro-thermal equilibrium control model, an efficient muffle-blower fan, and an innovative gas equipment for uniform film deposition processes. It is also designed with a range of safety features to ensure the safety of its users.