Used TEL / TOKYO ELECTRON Formula-1S-M #9402239 for sale

TEL / TOKYO ELECTRON Formula-1S-M is a diffusion furnace and accessorie designed for the manufacture of semiconductor materials. It is a single-wafer diffusion furnace equipped with both high-efficiency thermal oxidation and ion implantation systems, which are capable of processing large-sized wafers. This diffusion furnace is designed to provide precise temperature and pressure control, enabling precise control of the diffusion process. It is equipped with advanced auto-tuning functions, which allow it to precisely adjust the necessary parameters to ensure optimal results. TEL Formula-1S-M also features high-efficiency wafer transfer motors and a high-efficiency water cooling equipment which enables rapid cooling of freshly processed wafers. It is capable of operating at a range of temperatures (up to 2,500° C), so you can be sure that high temperatures for rapid process time can be maintained. The system also features uniformity control and is compatible with a range of track-mounted and non-track-mounted wafer sizes. TOKYO ELECTRON Formula-1S-M diffusion furnace also includes multiple oven-less process chambers, which are controlled independently. This enables precise control and uniformity across the wafer. It is equipped with a dual-focus scanning electron microscope (SEM), so you can verify processes in real-time. Additionally, the unit is designed to provide reliability and repeatability, enabling precise control of the diffusion process. Formula-1S-M diffusion furnace is designed to operate on alternating current (AC) voltage and power. It has an input voltage range of 190 to 255 volts and a maximum power of around 200 Amperes. The furnace is also equipped with a range of safety features, including insulation monitoring devices and over-temperature cut-off circuits. Overall, TEL / TOKYO ELECTRON Formula-1S-M diffusion furnace is a reliable and efficient machine for manufacturing semiconductor materials. It offers high levels of accuracy, control and process repeatability, combined with advanced auto-tuning features for optimal performance. Additionally, it features a range of safety features for secure operation and is designed for use with both track-mounted and non-track-mounted wafers.