Used TEL / TOKYO ELECTRON Formula 2L1B #9309492 for sale

TEL / TOKYO ELECTRON Formula 2L1B is a two-stage horizontal diffusion furnace and accompanying accessories specifically designed to meet the requirements of lithography-based process applications. This equipment offers superior temperature uniformity, high throughput, and stringent accuracy. The 2L1B features two distinct furnace chambers: the process chamber and an RTP chamber. The process chamber houses the product wafer and is heated by Upper and Hot Plate tubes that induce an optimal temperature uniformity over the entire wafer. The hot plate temperature is independently regulated, enabling precise temperature control for each wafer. The RTP chamber is designed for rapid thermal processing, enabling shorter processing times resulting in a higher throughput. The 2L1B's accessorie package includes a cooling blower, a exhaust duct, a dilution duct, and safety panel among others. The cooling blower helps efficiently cool down the product wafer after processing and the exhaust duct efficiently exhausts the exhaust gases from the process chamber. The dilution duct helps regulate and adjust the tube temperatures in both chambers. The safety panel features an interlock system which ensures a safe process environment. The 2L1B also features advanced temperature and water control systems to further improve process quality. The temperature control system monitors and maintains the regulated temperatures for each furnace chamber, ensuring high process uniformity. The water control system improves temperature uniformity and provides excellent temperature accuracy and stability, resulting in superior wafer quality. Overall, TEL Formula 2L1B is an excellent choice for lithography-based process applications. Its two-stage horizontal furnace design and comprehensive accessorie package ensures superior temperature uniformity, high throughput, and superior temperature accuracy and stability. This equipment is available with a wide range of optional features and upgrades, making it one of the most robust diffusion systems on the market.