Used TEL / TOKYO ELECTRON FORMULA High-K #9290897 for sale

TEL / TOKYO ELECTRON FORMULA High-K is a diffusion furnace and associated accessories equipment from TEL that provides a high-density, high-performance diffusion process. TEL FORMULA High-K system is ideal for semiconductor device processing, offering superior uniformity, precision, and repeatability. Utilizing detailed process control, TOKYO ELECTRON FORMULA High-K is tailored to specific device processing applications, such as anneal, junction, activation, and lateral oxidation. For thermal or rapid thermal anneal (RTA) applications, FORMULA High-K offers superior uniformity and stability. With a wide temperature range and precise temperature control, the temperature of the wafer/high-K can be undertaken efficiently with little deviation from part to part. The high-K's "Tight Loop Control" (TLC) feature achieved by combining a closed loop PID (proportional integral derivative) control and a closed loop resistance control. The control algorithm allows precise temperature control over both short and long processes, enabling a wide range of thermal process parameters. TEL / TOKYO ELECTRON FORMULA High-K also features a direct drive gas injection unit, eliminating potential errors between the differential pressure, mass flow, and motor speed. This direct drive machine also offers a robust and clean exhaust tool. The direct drive injection asset reduces downtime due to maintenance, and improves the uniformity of the process. The exhaust model utilizes a diffuser to maximize efficiency, providing uniform gas distribution across the entire wafer area, even at high pressure levels. A wide range of accessories are available with TEL FORMULA High-K in order to meet specific device processing needs. The equipment is available with various types of coolers and heaters for efficient thermal control and process uniformity, as well as an internal electric gate for adjustable temperature and flow rate. Furthermore, accompanying tools such as a gate valve, oxidation thermistors, and pressure/flow controllers offer a comprehensive solution for modern device processing. In short, TOKYO ELECTRON FORMULA High-K enables tight control of diffusion processes from start to finish. This system enables high-density, high-performance diffusion processing of semiconductors, offering a range of desirable features such as precise temperature control, direct drive gas injection, and a robust exhaust unit. Along with this, a wide range of optional accessories provide additional control and precision for specific device processing needs, ensuring optimal results in device fabrication.