Used TEL / TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI #9381820 for sale
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ID: 9381820
Wafer Size: 12"
Vintage: 2011
Furnace, 12"
Process: HfSiOx
Heater type:
VMM-56-201 Low temp
(4) Zones: 150°C~600°C
Gas:
N2
Ar
O3
3-DMASi (Liquid)
H2O and TDMAH (Source tank)
(2) Boat systems KAWASAKI
Hard Disk Drive (HDD)
2011 vintage.
TEL / TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI is a diffusion furnace equipped with accessory components making it highly efficient and reliable in its duties of providing a professional-grade thermal processing environment. This system can handle a broad array of suitably-rated materials including wafers for various types of electronic and integrated circuit applications. The fixture is comprised of a vacuum chamber where the process takes place, along with feedthroughs, temperature sensors, climate control components, and controls. The Indy Plus-B is a vertical-style diffusion furnace capable of providing a temperature ranging between 500 to 1250° C and with a maximum operating pressure of 0.5 to 10 torr. The flash to flash cycle time of the unit is 15 seconds and the pumping cycle time is less than one hour. This allows for a continuous-flow process despite elevation changes in pressures or temperatures. The chamber has a diameter of 315mm with a height of 1100mm, and its maximum wafer load is 6". It is capable of providing various types of oxidation, nitridation, annealing, and diffusion processes. Additionally, the unit includes an Oxid mask, showerhead, and an eighteen-lift temperature control for the uniformity of the processing temperatures. The unit also features a 'Pulsed Digital Annealing' process of alternating between low and high temperatures with each cycle allowing for a faster temperature change and a stable thermal environment. This feature is thanks to the use of an external heating element along with the diffusion chamber's direct-transfer heating technology as well as its uniform temperature control capabilities. In this setting, the low and high temperature periods are alternated automatically resulting in faster process cycles than similar models. The unit is also equipped with an array of safety features. This includes automatic bottom interlock, over temperature shutoff, and gas flow interruption auto shutoff ensuring safety through a number of parameters. The unit also contains a double rotary vacuum valve for better efficiency when loading and unloading wafers as well as a hot-wall ceramic chamber for improved durability. TEL Indy Plus-B-MVCKNNRRTXI is a highly efficient and reliable industrialized diffusion furnace equipped with durable components, safety features, and adaptable temperature control capabilities. It is ideal for a variety of processes such as oxidation, nitridation, annealing, and diffusion and holds up to 6" wafers in its chamber. With its advanced design and a 15 seconds flash to flash cycle time, this diffusion furnace is an excellent choice for modern electronic and integrated circuit applications.
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