Used TEL / TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI #9381827 for sale
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ID: 9381827
Wafer Size: 12"
Vintage: 2011
Furnace, 12"
Process: HfSiOx
Heater type:
VMM-56-201 Low temp
(4) Zones: 150°C~600°C
Gas:
N2
Ar
O3
3-DMASi (Liquid)
H2O and TDMAH (Source tank)
(2) Boat systems KAWASAKI
Hard Disk Drive (HDD)
2011 vintage.
TEL / TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI is a mid-yield, vertically placed diffusion furnace with accessories. This furnace can be used to create high purity semiconductor materials. It is used in semiconductor production, especially for layered compound semiconductors. It features a large capacity wafer cassette, high temperature operation, and precise temperature and pressure control. The equipment includes a main chamber, multi-zone controller, exhaust system, and a range of accessories. The main chamber includes an heating zone, a cooling zone, and an observation port. The heating zone can accommodate up to 150 wafers at a time, with an automatic loader unit for easy loading and unloading. The heating zone also provides rapid thermal nitrogen annealing, which is used to create crystalline structures in semiconductor materials. The cooling zone has an array of cooling channels for uniform cooling of the wafers. The multi-zone controller can precisely adjust the temperature, pressure, and flow rate in each zone. It also allows the user to control the atmosphere within the furnace, including process gases, chamber vacuum, and quench gas. Additionally, the controller features programmable recipes for custom process control. The exhaust machine is fitted to the back of the main chamber and provides automatic pumping cycles for efficient evacuation and replacement of air. This allows for precise control of the atmospheric pressure in the cavity and helps to reduce the risk of explosions. Additionally, the exhaust tool is equipped with a long-life filter and scrubber to remove any contaminants from the process gases. TEL Indy Plus-B-MVCKNNRRTXI accessories include a range of quartzware, thermocouples, multi-valve equipment, and gas panels. The quartzware includes quartz boat, quartz cylinders, and quartz capsules. The thermocouples are used for temperature measurement and can be calibrated to ensure high level accuracy. The multi-valve equipment consists of several valves for controlling the atmosphere within the chamber. And the gas panels feature a range of manual and automated valves for precise gas delivery and control. Overall, TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI diffusion furnace is a powerful and precise asset for efficiently and accurately creating high purity semiconductor materials. It is a great choice for small to mid-size semiconductor production facilities.
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