Used TEL / TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI #9381828 for sale

ID: 9381828
Wafer Size: 12"
Vintage: 2012
Furnace, 12" Process: HFSiOX Type: LPCVD Rapid cooling unit Pump box VMM-56-201 Heater FUJIKIN Air valve MFC, MFM: AERA MAIN / APC: CKD Load lock system Display: GFC (2) Boat systems KAWASAKI Heater type: VMM-56-201 Low temp (4) Zones: 150°C~600°C Furnace subsystem: Automation system Heater Process chamber Temperature controller Scavenger Cooling water unit Gas subsystem: Gas supply unit Exhaust Vacuum line Gas: N2 PN2 Ar O3 3-DMASi (Liquid) H2O and TDMAH (Source tank) Missing parts: QUARTZ Wares (2) Hard Disk Drives (HDD) Manifold Power supply: 3 Phase, AC 480 V, Single phase, AC 120 V 2012 vintage.
TEL / TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI is a diffusion furnace designed to efficiently process semiconductor substrates. This furnace allows users to program custom diffusion recipes for specific processes. It features a convenient low-cost MVCKNNRRTXI power supply which can provide up to 25 amps of power. The equipment also offers an accurately adjustable temperature range from 325°C to 1050°C. The system is equipped with a sensitive thermal sensor to monitor and control all temperature-related processes. The chamber is designed to effectively dissipate heat to the outside environment for efficient operation. TEL Indy Plus-B-MVCKNNRRTXI is also equipped with advanced furnace control software and advanced process control features. This includes dynamic programming of chamber temperature, recipe selection and storage, automatic pre-conditioning, closed-loop temperature control and the ability to control both separate and linked channels. The unit also features remote self-diagnostics as well as programmable alarms. TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI is designed for high-temperature gas and chemical vapor deposition (CVD) processes, offering excellent process uniformity and a high degree of process control. It has been designed to reduce reaction diffusion loss and increase substrate temperature uniformity. The process chamber includes a high-precision multiple-zone heating feature which gives the user accurate control over the temperature of the process. Indy Plus-B-MVCKNNRRTXI also features automated load lock doors, enabling quick chamber loading and unloading. A vacuum seal-in mechanism prevents any outside contaminants from entering the chamber during the diffusion process. The chamber is also equipped with quartz wafer pods which can be programmed to give precise temperature cycling and precise timing of gas flows to create uniform film thicknesses and densities on the substrate. TEL / TOKYO ELECTRON Indy Plus-B-MVCKNNRRTXI also includes a number of accessories for advanced operation and protection. It includes loaded cassettes which allow for single-file processing as well as a gas manifolding machine which can integrate with process gases, ensuring even and uniform mixing of reactants in the chamber. Additionally, the tool is equipped with a mechanical safety shut-off valve and a finger-safe purge mechanism to protect against inadvertent release of process gases during operations. TEL Indy Plus-B-MVCKNNRRTXI diffusion furnace is an easy-to-use, reliable and cost-effective asset capable of producing uniform and consistent results for a variety of processes. The combination of features and accessories, along with its advanced control model, make it an ideal choice for all diffusion and deposition processes.
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