Used TEL / TOKYO ELECTRON IW-6 #293764341 for sale

ID: 293764341
Furnace Process: TEOS, D-Poly, HTO, Oxidation, Boron drive.
TEL / TOKYO ELECTRON IW-6 is a diffusion furnace and its associated accessories, developed and manufactured by TEL Ltd (TOKYO ELECTRON)based in Japan. It is used for diffusion processes such as thermal oxidation and reactive ion epitaxy (RIE) in the semiconductor, MEMS and data storage industries. The furnace is designed with a single heating element, accommodates up to 6" wafers, and can reach a maximum temperature of 1100°C. It offers a wide range of options such as a low temperature kit (-50°C to 200°C) for thermal oxidation and RIE processes, a high temperature kit (300°C to 1100°C) for oxidation and dopant diffusion, and an HTL+ head and high frequency plasma generator. The low temperature kit offers precise and uniform temperature control, short cycle times, a 0.6"×6" susceptor which can hold up to 8 wafers, a high-frequency RF generator with a maximum power output of 150 watts, and a special ceramic heaters. The high temperature kit also provides precise and uniform temperature control, and it is equipped with ceramic heaters, a high temperature susceptor, and an improved controller. The HTL+ head is used to generate a non-thermal plasma between 200°C and 1000°C and is used in the etch process. The integrated environment monitoring system provides precise control of both the temperature and the atmosphere in the furnace chamber. It can be set up to perform automatic temperature and atmosphere control, as well as process control. TEL IW-6 is a reliable, easy-to-operate, and cost-effective diffusion furnace. It offers uniform and precise temperature control, a wide operational range and a low cycle time. It is ideal for use in RIE, thermal oxidation and diffusion processes in the semiconductor, MEMS and data storage industries. With its reliable performance and high quality output, this diffusion furnace is one of the best solutions for carrying out bulk substrate processing.
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