Used TEL / TOKYO ELECTRON IW-6 #9226343 for sale

TEL / TOKYO ELECTRON IW-6
ID: 9226343
Wafer Size: 5"
Vintage: 1995
Furnace, 5" 1995 vintage.
TEL / TOKYO ELECTRON IW-6 is a diffusion furnace and accessory designed for the fabrication of integrated circuits. It is an advanced tool used in semiconductor manufacturing processes to deposit materials on the exposed surfaces of a silicon wafer, producing a uniform coating to enhance the circuit characteristics. TEL IW-6 is a diffusion furnace that uses direct ion implantation for dopant distribution, a form of ion implanting that places dopants directly into the surface of the wafer instead of diffusing them through the entire wafer. It utilizes a high-temperature chamber to create the ideal environment for delivering dopants to the wafer surface. TOKYO ELECTRON IW-6 features an open-face configuration, allowing for more uniform doping and better control over the position and depth of individual dopants. The furnace is equipped with a long-line oven, a heat exchanger, an induction heater and various other accessories. The long-line oven heats up the exterior of the furnace, while the heat exchanger maintains a high temperature inside the working chamber. The induction heater contains two coils which create an electromagnetic field to heat up the interior of the oven. Additionally, the furnace is also fitted with multiple gas lines, allowing for different gases to be injected into the chamber. IW-6 is capable of highly precise doping processes. It features a PID controller, which allows for precise control of the temperature within the working chamber, as well as an advanced computer control equipment. This system offers automated and manual modes of operation, allowing processes to be optimized quickly and efficiently. Furthermore, the furnace is equipped with a vacuum measurement unit to monitor the pressure within the chamber and ensure the best possible results. Overall, TEL / TOKYO ELECTRON IW-6 is a reliable and versatile diffusion furnace and accessory that is perfect for the fabrication of integrated circuits. It produces highly accurate dopant distributions with tight temperature control and benefits from its advanced computer control machine, making it a powerful tool for the semiconductor industry.
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