Used TEL / TOKYO ELECTRON IW-6D #293798920 for sale

TEL / TOKYO ELECTRON IW-6D
ID: 293798920
Vintage: 1999
Diffusion furnace Process: Oxide Gases: H2, O2, HCL 1999 vintage.
TEL / TOKYO ELECTRON IW-6D is a diffusion furnace and associated accessories designed for the integrated production of advanced semiconductor devices. The basic equipment consists of a diffusion furnace and a controller cabinet, which provide the flexibility for a wide range of advanced production needs. The diffusion furnace is equipped with a workpiece transfer robot, allowing for concurrent transfer and processing of multiple wafers. It supports a variety of single- and multi-step process recipes, enabling production of a broad range of microelectronic devices over several steps. The workpiece chamber includes a hot wall area and a cold wall area, independent of the workpiece temperature, and is designed to provide clean, uniform temperature distribution throughout the chamber for optimal process performance. The system's intelligent robotics permit fast wafer transfer and full automated process sequence control. TEL IW-6D is equipped with the latest computer-aided control unit for process optimization and uniformity. It includes a memory for preset programs, as well as a wide variety of sensors, alarms, shutdown switches, and fail-safe mechanisms for a high level of operating safety. Additionally, the furnace is equipped with a gas flow mixer, a vacuum machine, and an air-cooling tool to ensure effective distribution of the gases throughout the process chamber. TOKYO ELECTRON IW-6D has a maximum temperature of 2,000C, and is fabricated using the latest in metal construction technologies. It is vacuum-tight and built to withstand the high temperatures used in diffusion processes. The asset is also equipped with a highly reliable horizontal single-shutter cooling model that is accurately controlled and incorporates a safe nitrogen flushing mechanism to quickly shut down the equipment in the event of an emergency. The diffusion furnace is capable of processing different process recipes, making it suitable for a wide range of diffusion processes. The easy-to-use graphical user interface enables great flexibility in setting up the process parameters. The control system also supports remote operation and data logging capabilities, allowing for greater control over the process and reducing the need for manual intervention. IW-6D is an advanced diffusion furnace and accessory unit that provides superior and precise performance. It is an ideal choice for integrated production of advanced semiconductor devices.
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