Used TEL / TOKYO ELECTRON IW-6D #9148336 for sale

TEL / TOKYO ELECTRON IW-6D diffusion furnace is a highly efficient and precise thermal treatment device that is used in applications requiring high-precision diffusion processing of silicon wafers. This technologically advanced diffusion furnace utilizes a single stage vertical PECVD chamber and unique two-level heating design to enable efficient low-pressure process performance. It operates by continuously adjusting the temperature profile during the diffusion process to reduce unwanted etching and to deliver superior uniformity and generation speed. Its precisely designed thermodynamics and adjustable heater proximity allow for excellent temperature control and uniformity. TEL IW-6D diffusion furnace comes with an advanced ultra-high purity door assembly that is designed with manufacturing and mission critical applications in mind. This effecient door system can be fitted with an array of components such as oxygen injection ports, dummy wafers, and multiple valves with anti-backing that allow for heavy use and quick process switching. TOKYO ELECTRON IW-6D diffusion furnace also comes equipped with a real-time control system to allow technicians to be able to easily and quickly monitor the process. This system is capable of controlling the data of the diffusion furnace as well as integrating various pre-set recipes based on the customers' requirements. IW-6D diffusion furnace also operates with extreme safety and reliability. It features a variety of safety sensors such as a fire detector and a vibration sensor, both of which ensure that the device is running smoothly. TEL / TOKYO ELECTRON IW-6D diffusion furnace is also protected from any internal or external shocks or vibrations that can potentially disturb the process. In addition, TEL IW-6D diffusion furnace can handle mass production applications as well as small-scale wafer processing and surface treatment. The furnace is capable of handling wafer size ranging from 200 mm in diameter to 5 inches in length. TOKYO ELECTRON IW-6D diffusion furnace is also able to accommodate a number of wafers of different types and sizes with the help of interchangeable wafer holders that are available with the device. IW-6D diffusion furnace provides an efficient and precise diffusion process which produces excellent results. Its advanced technology and safety features make it ideal for a variety of industrial applications. This diffusion furnace is very reliable and cost-effective and is the perfect choice for anyone who requires high-precision diffusion processing of silicon wafers.