Used TEL / TOKYO ELECTRON TELFORMULA 1-H #9206524 for sale

TEL / TOKYO ELECTRON TELFORMULA 1-H diffusion furnace is the latest in leading technology in in-line wafer processing. This single-wafer, vertically-loaded diffusion furnace offers high precision uniformity and repeatability. Its constant-flow electric furnace heated gas equipment provides reliable results for premium wafer processing with ultra-fine control of atmosphere and temperature. TEL TELFORMULA 1-H can reach temperatures of up to 1000°C, and features an automatic pressure control (APC) system, and high-contrast temperature indication meter (HTI) to ensure precision and accuracy. Its built-in nozzles are designed with a simplified gas delivery path, providing uniform gas flow and rapid gas purging capability. TOKYO ELECTRON TELFORMULA 1-H's low-uniformity workload support structure is especially designed for high-efficiency wafer processing. In addition, its low-pressure and high-accuracy wafer process sequence control simplifies process optimization. This significantly reduces the cost of wafer processing. TELFORMULA 1-H also features an intelligent process synchronization control, a temperature uniformity recognition unit, and an automatic wafer loading and unloading machine. This makes its productivity far superior to that of conventional diffusion furnaces. In addition, it is equipped with a modern user-friendly interface and can perform a vast number of recipe steps making it ideal for complex wafer processes. To ensure safety, TEL / TOKYO ELECTRON TELFORMULA 1-H is equipped with an emergency shutoff switch, a purge gas airflow monitor, and an infrared pyrometer which measure the furnace atmosphere in real time. Overall, with its advanced features, precision, and repeatability, TEL TELFORMULA 1-H diffusion furnace is the perfect choice for high-end wafer processing. Its reliable technology ensures consistent results and its intelligent user interface allows for simplified and optimized wafer processes.