Used TEL / TOKYO ELECTRON TELFORMULA 1-H #9206531 for sale

TEL / TOKYO ELECTRON TELFORMULA 1-H is a diffusion furnace and accessory from microfabrication company TEL (TOKYO ELECTRON). This is an advanced production-scale high-performance thermal processing tool that is ideal for applications such as rapid thermal processing, diffusion annealing, and oxidation processes. Its features include a robust design for harsh processing conditions, large wafer capacity (up to 4-inch square frames and 8-inch round frames), horizontal flow capability to improve wafer uniformity, low-pressure and high-temperature processing capability for higher process throughputs, a quartz window for fast and economical wafer observation, and data collection and analysis of the process via PC Connection Interface (PCCI), making it a highly flexible and reliable furnace for semiconductor processing. The furnace body is constructed out of high-grade stainless steel, and is designed to not only protect against temperature over/under-shoots, but to also help during rapid thermal process (RTP) tasks by maintaining a uniform temperature distribution throughout the wafer. Its temperature ranges for oxidation (700°C to 850°C) and rapid thermal processing (800°C to 1600°C) are particularly useful for advanced microfabrication. Further, the control processor to control gas flow, rate of heat-up and wafer cooling has an adjustable algorithm for improved uniformity. Another major feature of TEL TELFORMULA 1-H is its ratio-based heating and cooling system, which allows increased throughput by controlling heat-up and cool-down rates. On top of that, this furnace comes with an Oxide Uniformity Monitor (OUM), a controller that monitors the oxide thickness of each wafer in the chamber. It is capable of evaluating substrate level uniformity, enabling the user to adjust process parameters while the wafer is still in the chamber. Finally, TOKYO ELECTRON TELFORMULA 1-H comes with a quartz window, providing an easy-view for sampling and observing wafers. As quartz is highly resistant to temperature and chemically inert, it can also be used for high temperature and oxidation processes. TELFORMULA 1-H is a perfect tool for any semiconductor process. With its robust design, large wafer capacity, and ratio-based heating and cooling system, this is one of the most reliable and capable diffusion furnaces available on the market today.