Used TEL / TOKYO ELECTRON TELFORMULA Nitride #9253033 for sale

TEL / TOKYO ELECTRON TELFORMULA Nitride
ID: 9253033
Vertical LPCVD furnaces.
TEL / TOKYO ELECTRON TELFORMULA Nitride is a diffusion furnace and accessory that is designed to meet the demands of electronic device manufacture. The Nitride furnace is a special plasma assisted chemical vapor deposition (PECVD) tool that is used to deposit nitride materials. It is capable of processing three wafers at a time, and can reach temperatures of up to 1050°C. The furnace is equipped with an HL-UT processing chamber, which can be adjusted to allow vertical or horizontal processing. It is also fitted with upper and lower gas supply channels, allowing the furnace to be used for both standard and high temperature oxidation processes. The Nitride furnace is equipped with an intelligent logic system, which is able to self-monitor, detect faults and shut-off automatically if an error is detected. It also has a 4-step operation mode for the user, allowing them to select from one of three pre-programmed deposition modes depending on the requirements of their application. The Nitride furnace is equipped with an RS-232 serial interface, allowing it to be connected to a compatible computer system for the monitoring and control of process parameters. It also has the capability to store up to 24 recipes with adjustable functions, allowing different process parameters to be set for different processes. The Nitride furnace is equipped with a powerful quartz lamp, which can provide up to 1200mJ per pulse and is protected by a shielding sheet. The lamp is suitable for use in various deposition processes, such as chemical vapor deposition and sputtering. It is also designed to last for many years, with a guaranteed lifetime of 20,000 hours. The Nitride furnace is designed to provide high levels of safety, with both a gas detector and a disconnect switch provided to ensure the safety of the operator. Additionally, an emergency stop button is available for fast and safe shut-off of the furnace. The Nitride also has a cooling system that reduces the temperature of the chamber quickly, allowing it to be opened and the processed wafer taken out after processing. Overall, TEL TELFORMULA Nitride is a powerful and reliable diffusion furnace, making it a perfect choice for the manufacture of electronic devices. It is easy to operate, provides flexible control over process parameters and is designed for safe and reliable operation.
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