Used TEL / TOKYO ELECTRON UL-2604-08-LS #9226230 for sale

TEL / TOKYO ELECTRON UL-2604-08-LS is a diffusion furnace and accessories that are designed for high-throughput wafer fabrication processes such as silicon wafer thinning, epitaxial deposition, and transistor fabrication. It features a large-diameter, bottom-loading crucible, a robust crystal-mixing chamber, and low-vacuum ports. The furnaces bottom-loading crucible is a larger diameter than conventional furnaces which ensures a uniform temperature distribution and higher, faster throughput with large wafers. The quartz-glass wall of the crucible also eliminates wafer-to-wafer contamination and defect formation. TEL UL-2604-08-LS is equipped with an advanced crystal-mixing chamber which produces excellent mixing processes for silicon-epitaxial deposition at both the atmospheric and nitrosyl hydrochloride deposition reactions. This ensures optimal quality of the deposited silicon epi layers and nearby devices. The furnace is further enhanced with low-vacuum ports and tight construction to ensure minimal contamination during the wafer treatment process. The port also enables gas pressure regulation for controlling the device's inductor insulation with adjustable temperature. A remote access servo controller is also included with TOKYO ELECTRON UL-2604-08-LS, allowing users to operate the furnace remotely from any PC while monitoring and managing the production process. Additionally, a multi-channel contact thermocouple ensures uniform temperature sensing with a highly stable temperature accuracy, fast response, and low power consumption. UL-2604-08-LS is a highly advanced diffusion furnace and accessories that provide optimized productivity for wafer fabrication processes. Its large-diameter bottom-loading crucible, crystal-mixing chamber, low-vacuum ports, and remote access all contribute to ensure high throughput and excellent device quality. With its advanced features, TEL / TOKYO ELECTRON UL-2604-08-LS is sure to meet the needs of any device fabrication process.