Used TEL / TOKYO ELECTRON UL 2604-08L #9395933 for sale

TEL / TOKYO ELECTRON UL 2604-08L is a diffusion furnace and accessory designed for use in semiconductor processing. It is a horizontal, hot-wall type diffusion furnace and is designed to process both P- and N-type semiconductor substrates simultaneously in a single chamber. This diffusion furnace is used for high purity films, such as silicon and gallium arsenide, for semiconductor device fabrication. TEL UL 2604-08L features an ultra-high vacuum (UHV) chamber made from a stainless steel atomizing equipment that provides excellent thermal stability and ensures uniform distribution of the gases within the chamber. The interior of the chamber is also equipped with heaters and temperature controllers for accurate control of temperatures across the surface. It is designed to process substrates up to 200mm in width and can operate at temperatures up to 800°C with a maximum temperature capability of up to 1100°C if the substrate sizes are under 140mm. In addition, the heater features a multi-zone temperature control for uniform heating across the chamber. TOKYO ELECTRON UL 2604-08L also offers increased motor torque and a longer life span with its double drive motor system. It is also capable of advanced thermal processing of the substrate, such as oxidation, nitridation, and other processes that are suitable for passing ultra-low frequency (ULF) signals as well as high frequency coupling. UL 2604-08L is designed with safety features such as an emergency stop button and an automated security unit. The machine also includes a power monitoring tool that monitors power consumption and will shut the asset down if the power consumption exceeds the preset level. Moreover, the model is equipped with an automatic purge equipment for the prevention of gas leaks. Its exhaust system has a built-in filter and can reduce the escape of hazardous gases. Overall, TEL / TOKYO ELECTRON UL 2604-08L diffusion furnace and accessory is ideal for processing semiconductor devices. It is built with a combination of superior engineering and advanced technology that ensures reliable and high quality products. This diffusion furnace allows users to achieve precise temperature control and excellent uniformity, making it an ideal choice for production scale processing of semiconductors.