Used TEL / TOKYO ELECTRON UL 2604-10H #61662 for sale

ID: 61662
Furnaces Cantilever loading system Pyrogenic gas system Furnace 1: Tube 1: Oxidation process (5) MFC Gas jungles with SCHUMACHER TSC107 bubbler MFC 1: High N2 MFC 2: High O2 MFC 3: Low O2 MFC 4: H2 MFC 5: Low N2 for SCHUMACHER Bubbler H2 O2 Torch Tube 2: Oxidation process (5) MFC Gas jungles with SCHUMACHER TSC107 Bubbler MFC 1: High N2 MFC 2: High O2 MFC 3: Low O2 MFC 4: H2 MFC 5: Low N2 for SCHUMACHER Bubbler H2 O2 Torch Tube 3: Boron diffusion process (2) MFC Gas jungles with SCHUMACHER Bubbler TSC107 MFC 1: High N2 MFC 2: High O2 Tube 4: Sinter process MFC Gas jungle with SCHUMACHER bubbler TSC107 Furnace 2: Tube 1: Drive in process (5) MFC Gas jungles with SCHUMACHER TSC107 bubbler MFC 1: High N2 MFC 2: High O2 MFC 3: Low O2 MFC 4: H2 MFC 5: Low N2 for SCHUMACHER bubbler H2 O2 Torch Tube 2: Drive in process (5) MFC Gas jungles with SCHUMACHER TSC107 bubbler MFC 1: High N2 MFC 2: High O2 MFC 3: Low O2 MFC 4: H2 MFC 5: Low N2 for SCHUMACHER bubbler H2 O2 Torch Tube 3: Boron diffusion process (2) MFC Gas jungles with SCHUMACHER bubbler TSC107 MFC 1: High N2 MFC 2: High O2 Tube 4: Sinter process MFC Gas jungle with SCHUMACHER bubbler TSC107.
TEL / TOKYO ELECTRON UL 2604-10H is a diffusion furnace & accessory. It is an advanced tool used in semiconductor manufacturing. It is used to grow thin films and coatings on various substrates, such as metallizing, dielectric and metal plating. TEL UL 2604-10H diffusion furnace is a top of the line product from TEL. It features 10 heating zones with the highest temperature ratings currently available in the market for production quality thin-film deposition. The maximum process temperature for this product is 2600°C, and it supports power levels up to 30 kW. TOKYO ELECTRON UL 2604-10H also provides a variety of control options which facilitate precise control over growth and deposition of materials. This includes Pt 100 resistive thermometer control, as well as over-temperature protection. This ensures that any process error due to over-temperature is corrected quickly and efficiently. UL 2604-10H features a double-forged SILTECH Cu-Mo-Cr crucible furnace with an extra-large working chamber. This allows for a much larger deposition area, allowing users to achieve superior film deposition uniformity. In addition to its high performance, TEL / TOKYO ELECTRON UL 2604-10H is also incredibly reliable and safe. The furnace features a proprietary safety equipment, which monitors and protects the furnace from process and safety faults. The furnace is also dustproof, with dust particles remaining inside the system, preventing dust and harmful solvents from entering the chamber. TEL UL 2604-10H also features a variety of accessories, including quartz crucibles, C4 ultra-clean processing modules, and a vacuum unit. This allows users to customize the processing equipment and components to meet the specific needs of their process. Overall, TOKYO ELECTRON UL 2604-10H from TOKYO ELECTRON is a top-of-the-line thermal deposition machine, designed to meet the highest standards of quality and performance. With impressive temperature, power and control capabilities, as well as a variety of accessories and safety features, this diffusion furnace & accessory is perfect for a variety of semiconductor, microfabrication and thin-film deposition applications.
There are no reviews yet